SCHEMBL1978807

SCHEMBL1978807

O=C(Cc1ccccc1)OCCOCCOC(=O)C(=O)c1ccccc1

nearest known ligand 0.54

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.51
MAPK1 P28482 2/20 0.51
L3MBTL1 Q9Y468 2/20 0.51
PAM P19021 1/20 0.50
TDP1 Q9NUW8 2/20 0.47
KMT2A Q03164 2/20 0.44
ALOX5 P09917 1/20 0.44
TSHR P16473 1/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
SLC6A2 P23975 1/20 0.40
SLC6A3 Q01959 1/20 0.40
MGLL Q99685 2/20 0.40
CYP19A1 P11511 1/20 0.39
CES2 O00748 1/20 0.39
CES1 P23141 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL28017400 0.98 ALDH1A1 (0.50) ALDH1A1MAPK1L3MBTL1PAMTDP1
SCHEMBL3896265 0.90 PAM (0.57) ALDH1A1MAPK1L3MBTL1PAMTDP1
SCHEMBL29257166 0.88 SMN1; SMN2 (0.42) ALDH1A1MAPK1L3MBTL1TDP1KMT2A
SCHEMBL14336890 0.87 ALDH1A1 (0.66) ALDH1A1MAPK1L3MBTL1PAMTDP1
SCHEMBL14337318 0.87 ALDH1A1 (0.66) ALDH1A1MAPK1L3MBTL1PAMTDP1
SCHEMBL3312136 0.87 CES2 (0.50) ALDH1A1MAPK1L3MBTL1TDP1KMT2A
SCHEMBL30478610 0.87 CES2 (0.50) ALDH1A1MAPK1L3MBTL1TDP1KMT2A
SCHEMBL13982035 0.87 CES2 (0.50) ALDH1A1MAPK1L3MBTL1TDP1KMT2A
SCHEMBL665971 0.87 CES2 (0.50) ALDH1A1MAPK1L3MBTL1TDP1KMT2A
SCHEMBL220961 0.86 PAM (0.45) ALDH1A1MAPK1L3MBTL1PAMTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024086660-A2 SYSTEMS AND METHODS FOR STEREOLITHOGRAPHY THREE-DIMENSIONAL PRINTING HOLO, INC. (US) 2024-04-25 WO disclosed
EP-4326531-A1 SYSTEMS AND METHODS FOR STEREOLITHOGRAPHY THREE-DIMENSIONAL PRINTING Holo, Inc. (US) 2024-02-28 EP disclosed
EP-4302170-A1 SYSTEMS FOR THERMAL MANAGEMENT AND METHODS THEREOF Holo, Inc. (US) 2024-01-10 EP disclosed
EP-3969245-A1 STEREOLITHOGRAPHY THREE-DIMENSIONAL PRINTING SYSTEMS AND METHODS Holo, Inc. (US) 2022-03-23 EP disclosed
EP-3924320-A1 METHODS AND SYSTEMS FOR THREE-DIMENSIONAL PRINTING Holo, Inc. (US) 2021-12-22 EP disclosed
EP-3902659-A1 SENSORS FOR THREE-DIMENSIONAL PRINTING SYSTEMS AND METHODS Holo, Inc. (US) 2021-11-03 EP disclosed
EP-3810985-A1 LIGHT EMISSIVE DISPLAYS COMPRISING OVERPRINT VARNISHES Sun Chemical Corporation (US) 2021-04-28 EP disclosed
WO-2020232178-A1 DEVICES, SYSTEMS AND METHODS FOR THERMAL MANAGEMENT HOLO, INC. (US) 2020-11-19 WO disclosed
EP-3638485-A1 METHODS AND SYSTEMS FOR STEREOLITHOGRAPHY THREE-DIMENSIONAL PRINTING Holo, Inc. (US) 2020-04-22 EP disclosed
EP-3625056-A1 VISCOUS FILM THREE-DIMENSIONAL PRINTING SYSTEMS AND METHODS Holo, Inc. (US) 2020-03-25 EP disclosed
EP-2509793-A1 MARKING BASED ON MODIFIED CHIRAL LIQUID CRYSTAL POLYMERS SICPA Holding SA (CH) 2012-10-17 EP disclosed
WO-2012138844-A2 NON-AQUEOUS ELECTROLYTES FOR LITHIUM-AIR BATTERIES UCHICAGO ARGONNE, LLC (US) 2012-10-11 WO disclosed
CN-101932641-B Transparent composite material SHOWA DENKO KK 2012-09-19 CN disclosed
WO-2012076533-A1 SIMPLIFIED CONTROL OF COLOR SHIFTING PROPERTIES OF A CHIRAL LIQUID CRYSTAL POLYMER SICPA HOLDING SA (CH) 2012-06-14 WO disclosed
WO-2012076534-A1 COMPOSITE MARKING BASED ON CHIRAL LIQUID CRYSTAL PRECURSORS SICPA HOLDING SA (CH) 2012-06-14 WO disclosed
WO-2011069692-A1 MARKING BASED ON MODIFIED CHIRAL LIQUID CRYSTAL POLYMERS SICPA HOLDING SA (CH) 2011-06-16 WO disclosed
WO-2011069691-A1 MARKING BASED ON CHIRAL LIQUID CRYSTAL POLYMERS SICPA HOLDING SA (CH) 2011-06-16 WO disclosed
WO-2011069690-A1 MODIFIED MARKING BASED ON CHIRAL LIQUID CRYSTAL POLYMERS SICPA HOLDING SA (CH) 2011-06-16 WO disclosed
CN-101932641-A Transparent composite SHOWA DENKO KK 2010-12-29 CN disclosed
CN-101925840-A Resin composition for forming clad layer, resin film for forming clad layer using same, and optical waveguide and optical module using same HITACHI CHEMICAL CO LTD 2010-12-22 CN disclosed