SCHEMBL19795485

SCHEMBL19795485

CCCOC(=O)c1c(F)cc(F)c(F)c1F

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 4/20 0.51
ALDH1A1 P00352 3/20 0.46
LMNA P02545 1/20 0.44
TDP1 Q9NUW8 2/20 0.43
CHRM1 P11229 1/20 0.43
TSHR P16473 1/20 0.43
SLC6A2 P23975 1/20 0.43
KDR P35968 1/20 0.43
NR1H2 P55055 1/20 0.41
NR1H3 Q13133 1/20 0.41
KDM4E B2RXH2 2/20 0.40
POLB P06746 1/20 0.40
HSD17B10 Q99714 1/20 0.39
MAPT P10636 2/20 0.39
CA1 P00915 3/20 0.38
CA2 P00918 3/20 0.38
CA4 P22748 2/20 0.38
AKR1C4 P17516 1/20 0.38
AKR1C3 P42330 1/20 0.38
AKR1C2 P52895 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19795497 0.91 ESR1 (0.53) ESR1ALDH1A1LMNATDP1CHRM1
SCHEMBL1999063 0.85 NR1H2 (0.52) ESR1ALDH1A1TDP1TSHRNR1H2
SCHEMBL522911 0.85 ESR1 (0.67) ESR1ALDH1A1LMNATDP1CHRM1
SCHEMBL31590871 0.84 ALDH1A1 (0.47) ESR1ALDH1A1LMNATDP1CHRM1
SCHEMBL19795495 0.83 ESR1 (0.65) ESR1ALDH1A1LMNATDP1CHRM1
SCHEMBL8348591 0.83 ESR1 (0.59) ESR1ALDH1A1LMNATDP1CHRM1
SCHEMBL6231391 0.81 ESR1 (0.51) ESR1ALDH1A1TDP1CHRM1TSHR
SCHEMBL521630 0.79 ALDH1A1 (0.43) ESR1ALDH1A1LMNATDP1CHRM1
SCHEMBL31448662 0.79 CA1 (0.50) ESR1CA1CA2CA4KMT2A
SCHEMBL19795490 0.79 ALDH1A1 (0.55) ESR1ALDH1A1LMNATDP1CHRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230350294-A1 Negative Photosensitive Resin Composition, Patterning Process, Interlayer Insulating Film, Surface Protection Film, And Electronic Component SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-02 US disclosed
US-11768434-B2 Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-26 US disclosed
US-20180024434-A1 TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-01-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180024434-A1 TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM F12, RTF1, PUF60 ESR1 731/4885ALDH1A1 2329/4885LMNA 1156/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.