SCHEMBL19795490

SCHEMBL19795490

CCCOC(=O)c1cc(F)c(F)c(F)c1F

nearest known ligand 0.55

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.55
LMNA P02545 2/20 0.44
TSHR P16473 4/20 0.43
ESR1 P03372 3/20 0.43
TDP1 Q9NUW8 2/20 0.43
CHRM1 P11229 1/20 0.43
SLC6A2 P23975 1/20 0.43
KDR P35968 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
KDM4E B2RXH2 2/20 0.42
HSD17B10 Q99714 1/20 0.42
TP53 P04637 1/20 0.42
CYP3A4 P08684 1/20 0.42
MAPK1 P28482 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1893480 0.90 TSHR (0.57) ALDH1A1LMNATSHRESR1TDP1
SCHEMBL7592037 0.87 ALDH1A1 (0.49) ALDH1A1LMNATSHRESR1TDP1
SCHEMBL2832574 0.85 ALDH1A1 (0.47) ALDH1A1LMNATSHRESR1TDP1
SCHEMBL2001481 0.85 TSHR (0.52) ALDH1A1LMNATSHRTDP1L3MBTL1
SCHEMBL7591357 0.85 ALDH1A1 (0.50) ALDH1A1LMNATSHRESR1TDP1
SCHEMBL7591337 0.82 ALDH1A1 (0.47) ALDH1A1LMNATSHRESR1TDP1
SCHEMBL19795497 0.80 ESR1 (0.53) ALDH1A1LMNATSHRESR1TDP1
SCHEMBL9248670 0.79 CYP1A2 (0.60) ALDH1A1LMNAESR1L3MBTL1
SCHEMBL9414652 0.79 ESR1 (0.60) ALDH1A1TSHRESR1TDP1L3MBTL1
SCHEMBL19795485 0.79 ESR1 (0.51) ALDH1A1LMNATSHRESR1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230350294-A1 Negative Photosensitive Resin Composition, Patterning Process, Interlayer Insulating Film, Surface Protection Film, And Electronic Component SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-02 US disclosed
US-11768434-B2 Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-26 US disclosed
US-20180024434-A1 TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-01-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180024434-A1 TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM F12, RTF1, PUF60 ALDH1A1 2329/4885LMNA 1156/4885TSHR 2176/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.