SCHEMBL19795502

SCHEMBL19795502

Cc1c(F)c(F)c(C(=O)OCC(C)C)c(F)c1F

nearest known ligand 0.50

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TAS1R3 Q7RTX0 10/20 0.50
TAS1R1 Q7RTX1 10/20 0.50
TAS1R2 Q8TE23 10/20 0.50
TSHR P16473 4/20 0.46
ALDH1A1 P00352 1/20 0.46
ESR1 P03372 1/20 0.41
CACNA1F O60840 2/20 0.39
CACNA1D Q01668 2/20 0.39
CACNA1S Q13698 2/20 0.39
CACNA1C Q13936 2/20 0.39
MAPT P10636 1/20 0.38
GPR35 Q9HC97 1/20 0.35
MAPK1 P28482 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19795504 0.90 TSHR (0.50) TAS1R3TAS1R1TAS1R2TSHRALDH1A1
SCHEMBL17965785 0.80 ALDH1A1 (0.52) TSHRALDH1A1CACNA1FCACNA1DCACNA1S
SCHEMBL19795499 0.80 TSHR (0.49) TSHRALDH1A1ESR1CACNA1FCACNA1D
SCHEMBL19795498 0.79 TSHR (0.47) TSHRALDH1A1ESR1CACNA1FCACNA1D
SCHEMBL27980799 0.79 ESR1 (0.44) TAS1R3TAS1R1TAS1R2TSHRESR1
SCHEMBL19795492 0.76 ESR1 (0.59) TAS1R3TAS1R1TAS1R2TSHRALDH1A1
SCHEMBL19826159 0.75 TAS1R3 (0.47) TAS1R3TAS1R1TAS1R2
SCHEMBL522227 0.73 ESR1 (0.55) TSHRALDH1A1ESR1MAPTMAPK1
SCHEMBL5078862 0.73 FHIT (0.50) TSHRALDH1A1CACNA1FCACNA1DCACNA1S
SCHEMBL27523386 0.72 ALDH1A1 (0.52) TSHRALDH1A1ESR1CACNA1FCACNA1D

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230350294-A1 Negative Photosensitive Resin Composition, Patterning Process, Interlayer Insulating Film, Surface Protection Film, And Electronic Component SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-02 US disclosed
US-11768434-B2 Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-26 US disclosed
US-20180024434-A1 TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-01-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180024434-A1 TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM F12, RTF1, PUF60 TAS1R3 481/4885TAS1R1 257/4885TAS1R2 325/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.