Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 2/20 | 0.44 |
| ▸ | MGAM | O43451 | 1/20 | 0.44 |
| ▸ | SI | P14410 | 1/20 | 0.44 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.41 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.38 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.38 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1237869 | 1.00 | GAA (0.44) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL1904864 | 1.00 | GAA (0.44) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL17266817 | 0.86 | GAA (0.43) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL28992500 | 0.84 | GAA (0.36) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL29074325 | 0.82 | MGAM (0.34) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL5178113 | 0.81 | GAA (0.46) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL8668654 | 0.81 | GAA (0.46) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL13602465 | 0.81 | GAA (0.46) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL10497834 | 0.80 | ALDH1A1 (0.33) | ALDH1A1 | |
| SCHEMBL6116793 | 0.80 | L3MBTL1 (0.46) | GAAMGAMSIMGAM2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 372 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12620622-B2 | Compound including sulfur-containing heterocyclic cation and bis(oxolato)borate anion, electrolytic solution and electrochemical device including the same | DAIKIN INDUSTRIES, LTD. (JP) | 2026-05-05 | — | — | US | disclosed |
| US-20250260063-A1 | ELECTROLYTIC SOLUTION, ELECTROCHEMICAL DEVICE, SECONDARY BATTERY, AND LITHIUM-ION SECONDARY BATTERY | DAIKIN INDUSTRIES, LTD. (JP) | 2025-08-14 | — | — | US | disclosed |
| EP-3780232-B1 | ELECTROLYTIC SOLUTION, ELECTROCHEMICAL DEVICE, LITHIUM-ION SECONDARY BATTERY, AND MODULE | DAIKIN IND LTD (JP) | 2025-07-30 | — | — | EP | disclosed |
| US-20250174720-A1 | ELECTROLYTE, ELECTROCHEMICAL DEVICE, LITHIUM ION SECONDARY BATTERY, AND MODULE | DAIKIN INDUSTRIES, LTD. (JP) | 2025-05-29 | — | — | US | disclosed |
| US-12315885-B2 | Electrolytic solution, electrochemical device, lithium-ion secondary battery, and module | DAIKIN INDUSTRIES, LTD. (JP) | 2025-05-27 | — | — | US | disclosed |
| EP-4553940-A1 | SECONDARY BATTERY | DAIKIN INDUSTRIES, LTD. (JP) | 2025-05-14 | — | — | EP | disclosed |
| EP-4553918-A1 | NEGATIVE ELECTRODE, BATTERY, AND METHOD FOR COVERING BATTERY MATERIAL | DAIKIN INDUSTRIES, LTD. (JP) | 2025-05-14 | — | — | EP | disclosed |
| EP-4546456-A1 | SURFACE TREATMENT AGENT FOR ELECTRODE MATERIAL, POSITIVE ELECTRODE ACTIVE MATERIAL, CURRENT COLLECTOR FOIL, NEGATIVE ELECTRODE ACTIVE MATERIAL, CONDUCTIVE AID, ELECTRODE, BATTERY, METHOD FOR MANUFACTURING POSITIVE ELECTRODE ACTIVE MATERIAL, METHOD FOR MANUFACTURING CURRENT COLLECTOR FOIL, METHOD FOR MANUFACTURING NEGATIVE ELECTRODE ACTIVE MATERIAL, METHOD FOR MANUFACTURING CONDUCTIVE AID, AND METHOD FOR MANUFACTURING ELECTRODE | DAIKIN INDUSTRIES, LTD. (JP) | 2025-04-30 | — | — | EP | disclosed |
| US-20250132344-A1 | SURFACE TREATMENT AGENT FOR ELECTRODE MATERIAL, POSITIVE ELECTRODE ACTIVE MATERIAL, CURRENT COLLECTOR FOIL, NEGATIVE ELECTRODE ACTIVE MATERIAL, CONDUCTIVE AID, ELECTRODE, BATTERY, METHOD FOR MANUFACTURING POSITIVE ELECTRODE ACTIVE MATERIAL, METHOD FOR MANUFACTURING CURRENT COLLECTOR FOIL, METHOD FOR MANUFACTURING NEGATIVE ELECTRODE ACTIVE MATERIAL, METHOD FOR MANUFACTURING CONDUCTIVE AID, AND METHOD FOR MANUFACTURING ELECTRODE | DAIKIN INDUSTRIES, LTD. (JP) | 2025-04-24 | — | — | US | disclosed |
| EP-4539193-A1 | ELECTROLYTE SOLUTION AND SECONDARY BATTERY USING SAME | DAIKIN INDUSTRIES, LTD. (JP) | 2025-04-16 | — | — | EP | disclosed |
| US-20030008231-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-01-09 | — | — | US | disclosed |
| US-20020161148-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-10-31 | — | — | US | disclosed |
| US-20020051935-A1 | Resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-05-02 | — | — | US | disclosed |
| US-20020051936-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-02 | — | — | US | disclosed |
| US-20020048724-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-25 | — | — | US | disclosed |
| US-20020004569-A1 | Polymer, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-10 | — | — | US | disclosed |
| US-20010038969-A1 | Novel polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. OF (JP) | 2001-11-08 | — | — | US | disclosed |
| US-20010033989-A1 | Novel polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-25 | — | — | US | disclosed |
| US-20010018162-A1 | Novel polymers, chemical amplification resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1126322-A2 | Fluorine-containing polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-22 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250174720-A1 | ELECTROLYTE, ELECTROCHEMICAL DEVICE, LITHIUM ION SECONDARY BATTERY, AND MODULE | HCN2, HCN1, HCN3 | GAA 3690/4885MGAM 3705/4885SI 4172/4885 |
| US-12620622-B2 | Compound including sulfur-containing heterocyclic cation and bis(oxolato)borate anion, electrolytic solution and electrochemical device including the same | ASH2L, OLA1, ODC1 | GAA 3344/4885MGAM 3291/4885SI 3686/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.