Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SOAT2 | O75908 | 1/20 | 0.42 |
| ▸ | ACAT1 | P24752 | 1/20 | 0.42 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.42 |
| ▸ | GAA | P10253 | 2/20 | 0.34 |
| ▸ | THRA | P10827 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24777446 | 0.76 | SOAT2 (0.43) | SOAT2ACAT1SOAT1 | |
| SCHEMBL8660749 | 0.75 | SOAT2 (0.45) | SOAT2ACAT1SOAT1GAATHRA | |
| SCHEMBL21973919 | 0.73 | POLB (0.32) | — | |
| SCHEMBL25692946 | 0.70 | ESR1 (0.34) | GAATHRATHRB | |
| SCHEMBL25631108 | 0.70 | LMNA (0.51) | SOAT2ACAT1SOAT1GAATHRB | |
| SCHEMBL20345249 | 0.69 | IDO1 (0.50) | GAA | |
| SCHEMBL9446304 | 0.69 | SOAT2 (0.57) | SOAT2ACAT1SOAT1GAA | |
| SCHEMBL9446292 | 0.69 | SOAT2 (0.57) | SOAT2ACAT1SOAT1GAA | |
| SCHEMBL19847377 | 0.69 | CDC25B (0.45) | GAA | |
| SCHEMBL20403879 | 0.69 | ALDH1A1 (0.50) | PKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3279734-B1 | POSITIVE RESIST COMPOSITION, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK BLANK | SHINETSU CHEMICAL CO (JP) | 2018-07-25 | — | — | EP | disclosed |
| EP-3343292-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2018-07-04 | — | — | EP | disclosed |
| EP-3279734-A1 | POSITIVE RESIST COMPOSITION, RESIST PATTERN FORMING PROCESS, AND PHOTOMASK BLANK | Shin-Etsu Chemical Co., Ltd. (JP) | 2018-02-07 | — | — | EP | disclosed |