Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HRH3 | Q9Y5N1 | 14/20 | 0.56 |
| ▸ | KCNH2 | Q12809 | 4/20 | 0.56 |
| ▸ | CYP2C9 | P11712 | 4/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.45 |
| ▸ | PPARG | P37231 | 2/20 | 0.44 |
| ▸ | PPARA | Q07869 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | HPGD | P15428 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14287837 | 0.87 | HRH3 (0.45) | HRH3KCNH2CYP2C9CYP3A4PPARG | |
| SCHEMBL7723704 | 0.86 | NOS3 (0.46) | HRH3KCNH2ALDH1A1MAPTSMN1; SMN2 | |
| SCHEMBL14287606 | 0.86 | HRH3 (0.44) | HRH3KCNH2CYP2C9CYP3A4PPARG | |
| SCHEMBL28826979 | 0.85 | HRH3 (0.65) | HRH3KCNH2CYP2C9CYP3A4 | |
| SCHEMBL14318440 | 0.85 | HRH3 (0.60) | HRH3KCNH2CYP2C9CYP3A4ALDH1A1 | |
| SCHEMBL7358862 | 0.84 | ALDH1A1 (0.45) | ALDH1A1MAPTSMN1; SMN2HPGD | |
| SCHEMBL10274532 | 0.84 | HRH3 (0.56) | HRH3KCNH2CYP2C9CYP3A4SMN1; SMN2 | |
| SCHEMBL9808038 | 0.83 | HRH3 (0.71) | HRH3KCNH2CYP2C9CYP3A4 | |
| SCHEMBL19968145 | 0.83 | HRH3 (0.55) | HRH3KCNH2CYP2C9CYP3A4ALDH1A1 | |
| SCHEMBL10798982 | 0.81 | HRH3 (0.60) | HRH3KCNH2CYP2C9CYP3A4SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9904168-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |