SCHEMBL1993508

SCHEMBL1993508

O=[N+]([O-])c1ccccc1NO.[AlH3]

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.59
KMT2A Q03164 4/20 0.59
ALDH1A1 P00352 4/20 0.58
MAPK1 P28482 3/20 0.58
TDP1 Q9NUW8 3/20 0.58
L3MBTL1 Q9Y468 2/20 0.58
CASP7 P55210 1/20 0.58
MAPT P10636 5/20 0.56
GAA P10253 4/20 0.56
PKM P14618 1/20 0.56
KCNMA1 Q12791 1/20 0.51
KAT2B Q92831 2/20 0.50
CA1 P00915 1/20 0.50
CA2 P00918 1/20 0.50
MMP1 P03956 1/20 0.50
MMP2 P08253 1/20 0.50
MMP9 P14780 1/20 0.50
MMP8 P22894 1/20 0.50
MMP13 P45452 1/20 0.50
POLB P06746 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL728448 0.98 MEN1 (0.61) MEN1KMT2AALDH1A1MAPK1TDP1
SCHEMBL9062960 0.96 MEN1 (0.59) MEN1KMT2AALDH1A1MAPK1TDP1
Ammonia Solution, Strong SCHEMBL9616083 0.96 MEN1 (0.59) MEN1KMT2AALDH1A1MAPK1TDP1
Ammonia Solution, Strong SCHEMBL2832169 0.96 MEN1 (0.59) MEN1KMT2AALDH1A1MAPK1TDP1
SCHEMBL10433483 0.82 ALDH1A1 (0.63) MEN1KMT2AALDH1A1MAPK1TDP1
SCHEMBL397773 0.80 MAPK1 (0.77) MEN1KMT2AALDH1A1MAPK1TDP1
SCHEMBL1396225 0.80 GPR35 (0.58) MEN1KMT2AALDH1A1MAPK1TDP1
SCHEMBL6673056 0.79 TDP1 (0.67) MEN1KMT2AALDH1A1MAPK1TDP1
SCHEMBL6857920 0.78 KMT2A (0.73) MEN1KMT2AALDH1A1MAPK1TDP1
SCHEMBL11332310 0.78 KMT2A (0.73) MEN1KMT2AALDH1A1MAPK1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116789544-A Synthesis method of 2-chloropropionic acid 东营科源新材料有限公司 2023-09-22 CN claimed
CN-116606554-A 3D printing photosensitive silica gel and preparation method thereof 广州企精新材料有限公司 2023-08-18 CN claimed
CN-117343563-B Bio-based polyacrylate dispersion and preparation method and application thereof 江门瓦铂新材料有限公司 2024-07-02 CN disclosed
CN-117343563-A Bio-based polyacrylate dispersion and preparation method and application thereof 江门瓦铂新材料有限公司 2024-01-05 CN disclosed
CN-116606554-A 3D printing photosensitive silica gel and preparation method thereof 广州企精新材料有限公司 2023-08-18 CN disclosed
CN-113490599-B Ink jet ink 株式会社则武 2023-01-03 CN disclosed
CN-115380087-A Ink jet ink 株式会社则武 2022-11-22 CN disclosed
CN-115315492-A Ink jet ink 株式会社则武 2022-11-08 CN disclosed
CN-113490598-A Ink jet ink 株式会社则武 2021-10-08 CN disclosed
CN-113490599-A Ink jet ink 株式会社则武 2021-10-08 CN disclosed
CN-109476622-A The manufacturing method of gamma-butyrolactone derivative containing ethylene unsaturated group 捷恩智株式会社 2019-03-15 CN disclosed
CN-107001631-A Active energy ray-curable composition and use thereof 昭和电工株式会社 2017-08-01 CN disclosed
CN-107001632-A Actinic-radiation curable composition and application thereof 昭和电工株式会社 2017-08-01 CN disclosed
CN-105121513-B Enethiol-based curable composition and cured product thereof 昭和电工株式会社 2017-05-10 CN disclosed
CN-104093795-B Pigment dispersion for inkjet ink, active energy ray-curable inkjet ink, and printed matter DNP精细化工股份有限公司 2016-09-21 CN disclosed
US-9188868-B2 Lithographic printing plate precursors and processes for preparing lithographic printing plates FUJIFILM CORPORATION (JP) 2015-11-17 US disclosed
US-20140147789-A1 LITHOGRAPHIC PRINTING PLATE PRECURSORS AND PROCESSES FOR PREPARING LITHOGRAPHIC PRINTING PLATES FUJIFILM CORPORATION (JP) 2014-05-29 US disclosed
US-20110146516-A1 METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE FUJIFILM CORPORATION (JP) 2011-06-23 US disclosed