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Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL2832169

N.O=[N+]([O-])c1ccccc1NO

nearest known ligand 0.59

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 4/20 0.59
▸ KMT2A Q03164 4/20 0.59
▸ ALDH1A1 P00352 4/20 0.58
▸ MAPK1 P28482 3/20 0.58
▸ TDP1 Q9NUW8 3/20 0.58
▸ L3MBTL1 Q9Y468 2/20 0.58
▸ CASP7 P55210 1/20 0.58
▸ MAPT P10636 5/20 0.56
▸ GAA P10253 4/20 0.56
▸ PKM P14618 1/20 0.56
▸ KCNMA1 Q12791 1/20 0.51
▸ RAB9A P51151 4/20 0.51
▸ NPC1 O15118 3/20 0.51
▸ KAT2B Q92831 2/20 0.50
▸ CA1 P00915 1/20 0.50
▸ CA2 P00918 1/20 0.50
▸ MMP1 P03956 1/20 0.50
▸ MMP2 P08253 1/20 0.50
▸ MMP9 P14780 1/20 0.50
▸ MMP8 P22894 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL9616083 1.00 MEN1 (0.59) MEN1KMT2AALDH1A1MAPK1TDP1
SCHEMBL728448 0.98 MEN1 (0.61) MEN1KMT2AALDH1A1MAPK1TDP1
SCHEMBL9062960 0.96 MEN1 (0.59) MEN1KMT2AALDH1A1MAPK1TDP1
SCHEMBL1993508 0.96 MEN1 (0.59) MEN1KMT2AALDH1A1MAPK1TDP1
SCHEMBL10433483 0.82 ALDH1A1 (0.63) MEN1KMT2AALDH1A1MAPK1TDP1
SCHEMBL397773 0.80 MAPK1 (0.77) MEN1KMT2AALDH1A1MAPK1TDP1
SCHEMBL1396225 0.80 GPR35 (0.58) MEN1KMT2AALDH1A1MAPK1TDP1
SCHEMBL6673056 0.79 TDP1 (0.67) MEN1KMT2AALDH1A1MAPK1TDP1
SCHEMBL6857920 0.78 KMT2A (0.73) MEN1KMT2AALDH1A1MAPK1TDP1
SCHEMBL11332310 0.78 KMT2A (0.73) MEN1KMT2AALDH1A1MAPK1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117976547-B Method for reducing etching side erosion of copper-clad ceramic substrate solder 江苏富乐华功率半导体研究院有限公司 2024-08-13 — — CN claimed
CN-117976547-A Method for reducing etching side erosion of copper-clad ceramic substrate solder 江苏富乐华功率半导体研究院有限公司 2024-05-03 — — CN claimed
JP-4188118-A — — None — — JP disclosed
JP-62021711-A — — None — — JP disclosed
CN-117976547-B Method for reducing etching side erosion of copper-clad ceramic substrate solder 江苏富乐华功率半导体研究院有限公司 2024-08-13 — — CN disclosed
CN-117976547-A Method for reducing etching side erosion of copper-clad ceramic substrate solder 江苏富乐华功率半导体研究院有限公司 2024-05-03 — — CN disclosed
CN-114763393-B Cation exchanger, method for producing same, use thereof and polymer 朗盛德国有限责任公司 2024-03-08 — — CN disclosed
US-7741005-B2 A planographic printing plate precursor comprising: an aluminum support; and a photosensitive layer including a polymerization initiator, a polymerizable compound and a binder polymer; an oxygen barrier layer; and a protective layer including a filler; capable of image formation FUJIFILM CORPORATION (JP) 2010-06-22 — — US disclosed
EP-1839853-B1 Planographic printing plate precursor and stack thereof FUJIFILM CORP (JP) 2009-07-08 — — EP disclosed
US-20070231740-A1 A planographic printing plate precursor comprising: an aluminum support; and a photosensitive layer including a polymerization initiator, a polymerizable compound and a binder polymer; an oxygen barrier layer; and a protective layer including a filler; capable of image formation FUJIFILM CORPORATION (JP) 2007-10-04 — — US disclosed
EP-1839853-A1 Planographic printing plate precursor and stack thereof FUJIFILM Corporation (JP) 2007-10-03 — — EP disclosed
JP-H04188118-A NONLINEAR OPTICAL MATERIAL MATSUSHITA ELECTRIC IND CO LTD 1992-07-06 — — JP disclosed
JP-S6221711-A SELECTIVE SEPARATION AND RECOVERY OF GALLIUM UBE IND LTD 1987-01-30 — — JP disclosed