SCHEMBL19973272

SCHEMBL19973272

C[Si](C)(C)O[Si](C)(C)O[SiH2]NCC1CCCCC1

nearest known ligand 0.33

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.33
ADH1B P00325 1/20 0.32
ADH1C P00326 1/20 0.32
ADH1A P07327 1/20 0.32
ADH4 P08319 1/20 0.32
ADH7 P40394 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26964154 0.86 EPHX1 (0.36) EPHX1ADH1BADH1CADH1AADH4
SCHEMBL19973285 0.74 ADH1B (0.34) EPHX1ADH1BADH1CADH1AADH4
SCHEMBL19973228 0.69 CA12 (0.32)
SCHEMBL19973315 0.69 EPHX1 (0.39) EPHX1ADH1BADH1CADH1AADH4
SCHEMBL26964185 0.68 EPHX1 (0.36) EPHX1ADH1BADH1CADH1AADH4
SCHEMBL19973266 0.63 EPHX1 (0.35) EPHX1ADH1BADH1CADH1AADH4
SCHEMBL31302671 0.63 ADH1B (0.44) EPHX1ADH1BADH1CADH1AADH4
SCHEMBL25495235 0.62 CYP1A2 (0.35)
SCHEMBL20127092 0.62 ADH1C (0.31) ADH1CADH1A
SCHEMBL14797557 0.61 ADH1B (0.43) EPHX1ADH1BADH1CADH1AADH4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3516089-B1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS VERSUM MAT US LLC (US) 2023-12-20 EP claimed
US-11584854-B2 Compositions and methods for the deposition of silicon oxide films VERSUM MATERIALS US, LLC (US) 2023-02-21 US claimed
CN-113403605-A Compositions and methods for depositing silicon oxide films 弗萨姆材料美国有限责任公司 2021-09-17 CN claimed
US-20200308416-A1 Compositions And Methods For The Deposition Of Silicon Oxide Films VERSUM MATERIALS US, LLC (US) 2020-10-01 US claimed
US-20200040192-A9 Compositions and Methods for the Deposition of Silicon Oxide Films VERSUM MATERIALS US, LLC (US) 2020-02-06 US claimed
EP-3516089-A1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS Versum Materials US, LLC (US) 2019-07-31 EP claimed
US-20180127592-A1 Compositions and Methods for the Deposition of Silicon Oxide Films VERSUM MATERIALS US, LLC (US) 2018-05-10 US claimed
WO-2018053129-A1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS VERSUM MATERIALS US, LLC (US) 2018-03-22 WO claimed
EP-3516089-B1 COMPOSITIONS AND METHODS FOR THE DEPOSITION OF SILICON OXIDE FILMS VERSUM MAT US LLC (US) 2023-12-20 EP disclosed
CN-113403605-A Compositions and methods for depositing silicon oxide films 弗萨姆材料美国有限责任公司 2021-09-17 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200308416-A1 Compositions And Methods For The Deposition Of Silicon Oxide Films SEPTIN9, SGMS1, SGMS2 EPHX1 2375/4885ADH1B 3310/4885ADH1C 4024/4885
US-20180127592-A1 Compositions and Methods for the Deposition of Silicon Oxide Films SEPTIN9, SGMS1, SGMS2 EPHX1 2375/4885ADH1B 3310/4885ADH1C 4024/4885
US-20200040192-A9 Compositions and Methods for the Deposition of Silicon Oxide Films SEPTIN9, SGMS1, SGMS2 EPHX1 2375/4885ADH1B 3310/4885ADH1C 4024/4885
US-11584854-B2 Compositions and methods for the deposition of silicon oxide films SEPTIN9, SGMS1, SGMS2 EPHX1 2375/4885ADH1B 3310/4885ADH1C 4024/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.