SCHEMBL2833068

SCHEMBL2833068

O=C1OC(c2cc(I)c(O)c(I)c2)(c2cc(I)c(O)c(I)c2)c2ccccc21

nearest known ligand 0.80

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CXCR1 P25024 1/20 0.80
AVPR2 P30518 1/20 0.80
CCR4 P51679 1/20 0.80
AKR1C1 Q04828 1/20 0.68
MEN1 O00255 4/20 0.64
KMT2A Q03164 4/20 0.64
TDP1 Q9NUW8 4/20 0.64
L3MBTL1 Q9Y468 2/20 0.64
RECQL P46063 2/20 0.64
BLM P54132 2/20 0.64
ACE2 Q9BYF1 2/20 0.64
USP2 O75604 1/20 0.64
THRB P10828 1/20 0.64
CDK2 P24941 1/20 0.64
CHAT P28329 1/20 0.64
BLVRB P30043 1/20 0.64
RXFP1 Q9HBX9 1/20 0.64
HSP90AA1 P07900 2/20 0.63
LMNA P02545 4/20 0.62
MAPT P10636 4/20 0.62

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19978227 0.94 CXCR1 (0.72) CXCR1AVPR2CCR4AKR1C1MEN1
SCHEMBL19981313 0.94 CXCR1 (0.72) CXCR1AVPR2CCR4AKR1C1MEN1
SCHEMBL6728239 0.91 CXCR1 (0.67) CXCR1AVPR2CCR4AKR1C1MEN1
SCHEMBL4958920 0.84 LMNA (0.74) CXCR1AVPR2CCR4AKR1C1MEN1
SCHEMBL16285465 0.82 MAPT (0.73) CXCR1AVPR2CCR4AKR1C1MEN1
Ethane SCHEMBL11224255 0.82 AKR1C1 (0.94) CXCR1AVPR2CCR4AKR1C1MEN1
SCHEMBL8157518 0.81 TYMS (0.72) CXCR1AVPR2CCR4AKR1C1MEN1
SCHEMBL1649630 0.81 AKR1C1 (1.00) CXCR1AVPR2CCR4AKR1C1MEN1
SCHEMBL38664589 0.81 AKR1C1 (1.00) CXCR1AVPR2CCR4AKR1C1MEN1
SCHEMBL6724982 0.81 CXCR1 (0.61) CXCR1AVPR2CCR4AKR1C1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8216770-B2 aromatic polyester copolymer is alkali-developable photosensitive or thermal curable; used to form pattern on filter which exhibit physical properties resist to heat and chemicals, improve developability, and adhesiveness, high resolution; use for Liquid crystal display devices CHEIL INDUSTRIES INC. (KR) 2012-07-10 US claimed
EP-0991432-B1 Method and device for monitoring a sterilisation process MINNESOTA MINING & MFG (US) 2005-01-12 EP claimed
EP-0694809-B1 A novel class of grain growth modifiers for the preparation of high chloride (111) tabular grain emulsions (II) EASTMAN KODAK CO (US) 1999-10-06 EP claimed
EP-0694809-A1 A novel class of grain growth modifiers for the preparation of high chloride (111) tabular grain emulsions (II) EASTMAN KODAK COMPANY (US) 1996-01-31 EP claimed
US-5411852-A A phenol with at least two iodo substituents EASTMAN KODAK COMPANY (US) 1995-05-02 US claimed
US-12043702-B2 Polymer, composition, molded article, cured product and laminate JSR CORPORATION (JP) 2024-07-23 US disclosed
EP-3766919-B1 POLYMER, COMPOSITION, MOLDED ARTICLE, CURED PRODUCT AND LAMINATE JSR CORP (JP) 2024-02-21 EP disclosed
CN-113861407-B Polymer, composition, and molded article JSR株式会社 2024-02-20 CN disclosed
US-11505651-B2 Polymer, composition, molded article, cured product and laminate JSR CORPORATION (JP) 2022-11-22 US disclosed
US-20220235179-A1 POLYMER, COMPOSITION, MOLDED ARTICLE, CURED PRODUCT AND LAMINATE JSR CORPORATION (JP) 2022-07-28 US disclosed
US-11156916-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-26 US disclosed
EP-3770202-A1 POLYMER, COMPOSITION, MOLDED ARTICLE, CURED PRODUCT AND LAMINATE JSR Corporation (JP) 2021-01-27 EP disclosed
EP-0731379-A1 Photographic emulsions containing tabular grains with a band structure and a central grain portion of high bromide concentration EASTMAN KODAK COMPANY (US) 1996-09-11 EP disclosed
EP-0701166-A1 Grain growth process for the preparation of high bromide ultrathin tabular grain emulsions EASTMAN KODAK COMPANY (US) 1996-03-13 EP disclosed
EP-0694809-A1 A novel class of grain growth modifiers for the preparation of high chloride (111) tabular grain emulsions (II) EASTMAN KODAK COMPANY (US) 1996-01-31 EP disclosed
EP-0670514-A2 High chloride (100) tabular grain emulsions with modified edge structures EASTMAN KODAK COMPANY (US) 1995-09-06 EP disclosed
US-5332648-A Alklali soluble phenolic polymer, cyclic ester or sulfonate which converts to the acid, an onium salt which generates an an acid on exposure to radiation KABUSHIKI KAISHA TOSHIBA (JP) 1994-07-26 US disclosed
US-5231195-A Monomers for opthalmic lenses PPG INDUSTRIES, INC. (US) 1993-07-27 US disclosed
US-4167536-A Organopolysiloxane-phenolphthalein-polycarbonate copolymers GENERAL ELECTRIC COMPANY (US) 1979-09-11 US disclosed
US-4134936-A Copolycarbonates of phenolphthalein polycarbonates and other polycarbonates THE DOW CHEMICAL COMPANY (US) 1979-01-16 US disclosed