Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | BACE1 | P56817 | 2/20 | 0.43 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.41 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.41 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.41 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.41 |
| ▸ | MMP9 | P14780 | 5/20 | 0.40 |
| ▸ | MMP2 | P08253 | 4/20 | 0.40 |
| ▸ | MMP12 | P39900 | 3/20 | 0.40 |
| ▸ | MMP1 | P03956 | 3/20 | 0.40 |
| ▸ | MMP13 | P45452 | 3/20 | 0.40 |
| ▸ | CES2 | O00748 | 1/20 | 0.40 |
| ▸ | CES1 | P23141 | 1/20 | 0.40 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | MMP8 | P22894 | 2/20 | 0.39 |
| ▸ | MMP3 | P08254 | 1/20 | 0.39 |
| ▸ | MMP14 | P50281 | 1/20 | 0.39 |
| ▸ | MMP16 | P51512 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL3385544 | 0.91 | HSD11B1 (0.44) | HDAC4HDAC2HDAC8MMP9MMP2 | |
| Trifluoromethanesulfonic Acid SCHEMBL27572558 | 0.89 | BACE1 (0.50) | BACE1PTPN1HDAC4HDAC2HDAC8 | |
| Trifluoromethanesulfonic Acid SCHEMBL27925853 | 0.89 | BACE1 (0.50) | BACE1PTPN1HDAC4HDAC2HDAC8 | |
| Trifluoromethanesulfonic Acid SCHEMBL31473545 | 0.85 | PTPN1 (0.53) | PTPN1HDAC8MMP2MMP3MMP14 | |
| Biphenyl SCHEMBL28044662 | 0.85 | PTPN1 (0.39) | PTPN1HDAC4HDAC2HDAC8MMP9 | |
| Anisole SCHEMBL4551224 | 0.84 | CA4 (0.56) | BACE1CES2CES1CA1CA2 | |
| Biphenyl SCHEMBL1993781 | 0.83 | PTPN1 (0.44) | PTPN1MMP9MMP2MMP1MMP13 | |
| Trifluoromethanesulfonic Acid SCHEMBL17907399 | 0.81 | CA1 (0.44) | PTPN1HDAC2MMP1MMP13SMN1; SMN2 | |
| Biphenyl SCHEMBL27775707 | 0.81 | MMP3 (0.47) | PTPN1KCNH2MMP3RAB9AGAA | |
| Biphenyl SCHEMBL1992773 | 0.80 | PTPN1 (0.45) | PTPN1NPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026107261-A1 | PURIFICATION OF PHOTORESIST POLYMER BY SURFACE-MODIFIED POROUS POLYETHYLENE MEMBRANE | ENTEGRIS, INC. (US) | 2026-05-21 | — | — | WO | claimed |
| US-7399570-B2 | Water-soluble negative photoresist polymer and composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2008-07-15 | — | — | US | claimed |
| US-7361447-B2 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2008-04-22 | — | — | US | claimed |
| US-7338742-B2 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2008-03-04 | — | — | US | claimed |
| US-7282318-B2 | Photoresist composition for EUV and method for forming photoresist pattern using the same | HYNIX SEMICONDUCTOR INC. (KR) | 2007-10-16 | — | — | US | claimed |
| US-7279256-B2 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2007-10-09 | — | — | US | claimed |
| US-7270934-B2 | Water-soluble negative photoresist polymer, composition containing the same, and method of forming a photoresist pattern | HYNIX SEMICONDUCTOR INC. (KR) | 2007-09-18 | — | — | US | claimed |
| US-20070154837-A1 | Composition for hard mask and method for manufacturing semiconductor device | HYNIX SEMICONDUCTOR INC. (KR) | 2007-07-05 | — | — | US | claimed |
| US-7235349-B2 | Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator | HYNIX SEMICONDUCTOR INC. (KR) | 2007-06-26 | — | — | US | claimed |
| US-7138218-B2 | Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator | HYNIX SEMICONDUCTOR INC. (KR) | 2006-11-21 | — | — | US | claimed |
| US-20040265743-A1 | Photoresist polymer and photoresist composition including the same | HYNIX SEMICONDUCTOR INC. (KR) | 2004-12-30 | — | — | US | claimed |
| US-20040265735-A1 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2004-12-30 | — | — | US | claimed |
| US-6818376-B2 | OVERCOATING SEMICONDUCTOR SUBSTRATE WITH PHOTOSENSITIVE POLYMER; EXPOSURE TO RADIATION IN PRESENCE OF ACID GENERATOR | HYNIX SEMICONDUCTOR INC. (KR) | 2004-11-16 | — | — | US | claimed |
| US-6806025-B2 | FLUORINATED FUSED RING MONOMERS AND POLYMERS; MAYBE COPOLYMERIZED WITH A SUBSTITUTED MALEIMIDE AND/OR A TRIFLUOROMETHYL ACRYLATE | HYNIX SEMICONDUCTOR INC. (KR) | 2004-10-19 | — | — | US | claimed |
| US-20030148212-A1 | Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator | HYNIX SEMICONDUCTOR INC. (KR) | 2003-08-07 | — | — | US | claimed |
| US-20030091927-A1 | Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion | HYNIX SEMICONDUCTOR INC. (KR) | 2003-05-15 | — | — | US | claimed |
| US-20030022101-A1 | Photoresist monomers, polymers thereof and photoresist compositions containing the same | INTELLECTUAL DISCOVERY CO. LTD. (KR) | 2003-01-30 | — | — | US | claimed |
| US-20030022100-A1 | Photoresist monomers, polymers thereof and photoresist compositions containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-30 | — | — | US | claimed |
| US-20030003379-A1 | Photoresist monomers, polymers thereof and photoresist compositons containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-02 | — | — | US | claimed |
| US-20020160301-A1 | Cross-linker monomer comprising double bond and photoresist copolymer containing the same | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-10-31 | — | — | US | claimed |