Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSL | P07711 | 1/20 | 0.36 |
| ▸ | CTSB | P07858 | 1/20 | 0.36 |
| ▸ | CTSK | P43235 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | SPHK2 | Q9NRA0 | 4/20 | 0.33 |
| ▸ | SPHK1 | Q9NYA1 | 4/20 | 0.33 |
| ▸ | SLC1A3 | P43003 | 2/20 | 0.33 |
| ▸ | SLC1A2 | P43004 | 2/20 | 0.33 |
| ▸ | SLC1A1 | P43005 | 2/20 | 0.33 |
| ▸ | GBA1 | P04062 | 2/20 | 0.33 |
| ▸ | UGCG | Q16739 | 2/20 | 0.33 |
| ▸ | GBA2 | Q9HCG7 | 2/20 | 0.33 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.32 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.32 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.32 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.32 |
| ▸ | NAAA | Q02083 | 1/20 | 0.32 |
| ▸ | THRA | P10827 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10993458 | 0.97 | — | — | |
| SCHEMBL13896968 | 0.86 | ALDH1A1 (0.35) | — | |
| SCHEMBL1593544 | 0.86 | — | — | |
| SCHEMBL379081 | 0.83 | CTSL (0.41) | CTSLCTSBCTSKLMNASPHK2 | |
| SCHEMBL869115 | 0.83 | CTSL (0.41) | CTSLCTSBCTSKLMNASPHK2 | |
| SCHEMBL23039739 | 0.83 | CTSL (0.41) | CTSLCTSBCTSKLMNASPHK2 | |
| SCHEMBL29101108 | 0.83 | CTSL (0.41) | CTSLCTSBCTSKLMNASPHK2 | |
| SCHEMBL16239892 | 0.83 | CTSL (0.41) | CTSLCTSBCTSKLMNASPHK2 | |
| SCHEMBL14947972 | 0.82 | — | — | |
| SCHEMBL7739656 | 0.80 | SPHK1 (0.38) | CTSLCTSBCTSKLMNASPHK2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9522868-B2 | Tetrakis(ether-substituted formylphenyl) | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2016-12-20 | — | — | US | disclosed |
| US-20160016884-A1 | NEW TETRAKIS(ETHER-SUBSTITUTED FORMYLPHENYL) | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 2016-01-21 | — | — | US | disclosed |
| US-8889333-B2 | Salt, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-11-18 | — | — | US | disclosed |
| US-8889333-B2 | Salt, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-11-18 | — | — | US | disclosed |
| US-8741541-B2 | Compound, resin, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-06-03 | — | — | US | disclosed |
| US-8741541-B2 | Compound, resin, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-06-03 | — | — | US | disclosed |
| US-20120295201-A1 | COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20120295201-A1 | COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-11-22 | — | — | US | disclosed |
| US-20120264060-A1 | SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-18 | — | — | US | disclosed |
| US-20120264060-A1 | SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-18 | — | — | US | disclosed |
| US-6830871-B2 | Amplification type resist formulation: a resin monomer having a side chain containing specific partial structure; a compound capable of generating acid upon irradiation with a radiation; a low molecualr compound; a solvent | FUJI PHOTO FILM CO., LTD. (JP) | 2004-12-14 | — | — | US | disclosed |
| US-20040053161-A1 | Chemical amplification type resist composition | FUJI PHOTO FILM CO., LTD. | 2004-03-18 | — | — | US | disclosed |
| US-RE37979-E1 | Pyrimidine derivatives and anti-viral agent containing the same as active ingredient thereof | MITSUBISHI CHEMICAL CORPORATION | 2003-02-04 | — | — | US | disclosed |
| EP-0829476-B1 | 6-Substituted acyclopyrimidine nucleoside derivatives and antiviral agent containing the same as active ingredient thereof | MITSUBISHI CHEM CORP (JP) | 2002-08-28 | — | — | EP | disclosed |
| EP-0829476-A2 | 6-Substituted acyclopyrimidine nucleoside derivatives and antiviral agent containing the same as active ingredient thereof | Mitsubishi Chemical Corporation (JP) | 1998-03-18 | — | — | EP | disclosed |
| US-5461060-A | Antiretroviral activity | MITSUBISHI KASEI CORPORATION (JP) | 1995-10-24 | — | — | US | disclosed |
| EP-0420763-A2 | 6-Substituted acyclopyrimidine nucleoside derivatives and antiviral agent containing the same as active ingredient thereof | Mitsubishi Chemical Corporation (JP) | 1991-04-03 | — | — | EP | disclosed |
| US-4268681-A | HERBICIDES, PLANT GROWTH REGULATORS, INSECTICIDES, MITICIDES | BAYER AKTIENGESELLSCHAFT (DE) | 1981-05-19 | — | — | US | disclosed |
| US-4185991-A | 4,5-Dichloro-imidazole derivatives and their use as herbicides | BAYER AKTIENGESELLSCHAFT (DE) | 1980-01-29 | — | — | US | disclosed |
| US-4178166-A | HERBICIDES, INSECTICIDES, PLANT GROWTH REGULATORS | BAYER AKTIENGESELLSCHAFT (DE) | 1979-12-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120264060-A1 | SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | C1S, C1R, CLIC1 | CTSL 3122/4885CTSB 4527/4885CTSK 3950/4885 |
| US-20160016884-A1 | NEW TETRAKIS(ETHER-SUBSTITUTED FORMYLPHENYL) | AHR, PAH, ALK | CTSL 4668/4885CTSB 4715/4885CTSK 3364/4885 |
| US-20120295201-A1 | COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | C1R, C9, TMT1A | CTSL 2989/4885CTSB 3932/4885CTSK 3272/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.