Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 4/20 | 0.39 |
| ▸ | CA1 | P00915 | 14/20 | 0.37 |
| ▸ | CA2 | P00918 | 14/20 | 0.37 |
| ▸ | MMP1 | P03956 | 4/20 | 0.33 |
| ▸ | MMP2 | P08253 | 4/20 | 0.33 |
| ▸ | MMP9 | P14780 | 4/20 | 0.33 |
| ▸ | MMP8 | P22894 | 4/20 | 0.33 |
| ▸ | MMP13 | P45452 | 4/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30897218 | 1.00 | HSD11B1 (0.39) | HSD11B1CA1CA2MMP1MMP2 | |
| SCHEMBL31627575 | 0.99 | CA2 (0.38) | HSD11B1CA1CA2MMP1MMP2 | |
| SCHEMBL956713 | 0.99 | CA2 (0.38) | HSD11B1CA1CA2MMP1MMP2 | |
| SCHEMBL1516293 | 0.92 | HSD11B1 (0.36) | HSD11B1CA1CA2MMP1MMP2 | |
| SCHEMBL2003359 | 0.91 | CA1 (0.35) | HSD11B1CA1CA2MMP1MMP2 | |
| Trifluoromethanesulfonic Acid SCHEMBL220567 | 0.84 | HSD11B1 (0.44) | HSD11B1 | |
| SCHEMBL31651407 | 0.81 | HSD11B1 (0.38) | HSD11B1CA1CA2MMP1MMP2 | |
| SCHEMBL545789 | 0.81 | HSD11B1 (0.38) | HSD11B1CA1CA2MMP1MMP2 | |
| SCHEMBL1760814 | 0.80 | CA2 (0.37) | HSD11B1CA1CA2MMP1MMP2 | |
| SCHEMBL2479441 | 0.80 | CA2 (0.37) | HSD11B1CA1CA2MMP1MMP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 83 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250216763-A1 | ANTI-SPACER MASKING PROCESS USING RESIST LAYER WITH SOLUBILITY SHIFTING AGENT | TOKYO ELECTRON LTD (JP) | 2025-07-03 | — | — | US | disclosed |
| US-20250216783-A1 | ANTI-SPACER MASKING PROCESS USING SECOND SWITCHABLE POLYMER | TOKYO ELECTRON LTD (JP) | 2025-07-03 | — | — | US | disclosed |
| US-20250216782-A1 | MASKING PROCESS USING SWITCHABLE POLYMER | TOKYO ELECTRON LTD (JP) | 2025-07-03 | — | — | US | disclosed |
| WO-2025128334-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-06-19 | — | — | WO | disclosed |
| WO-2025128332-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-06-19 | — | — | WO | disclosed |
| US-20250189892-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-06-12 | — | — | US | disclosed |
| US-20250188311-A1 | POLY-O-HYDROXYAMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITIVE COMPOSITIONS, DIELECTRIC FILMS, AND BUFFER COATINGS CONTAINING THE SAME | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-06-12 | — | — | US | disclosed |
| WO-2025106697-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | disclosed |
| US-20250068079-A1 | BIO-BASED SOLVENTS FOR NEGATIVE TONE DEVELOPMENT | HUSTAD PHILLIP DENE (US) | 2025-02-27 | — | — | US | disclosed |
| WO-2024107979-A1 | BIO-BASED SOLVENTS FOR NEGATIVE TONE DEVELOPMENT | HUSTAD PHILLIP DENE (US) | 2024-05-23 | — | — | WO | disclosed |
| US-20030170562-A1 | A polymer having a silicon atom in a side chain, which is insoluble in aqueous alkali solution and becomes soluble in aqueous alkali solution by the action of an acid, generated by acid generator on exposure to active light radiation | FUJI PHOTO FILM CO., LTD. | 2003-09-11 | — | — | US | disclosed |
| EP-1299773-A1 | SILICON-CONTAINING ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-04-09 | — | — | EP | disclosed |
| EP-1299774-A1 | PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-04-09 | — | — | EP | disclosed |
| US-20030065101-A1 | Silicon-containing acetal protected polymers and photoresists compositions thereof | ARCH SPECIALITY CHEMICALS, INC. | 2003-04-03 | — | — | US | disclosed |
| US-20030064321-A1 | Free-acid containing polymers and their use in photoresists | ARCH SPECIALTY CHEMICALS, INC. | 2003-04-03 | — | — | US | disclosed |
| WO-2003021357-A1 | FREE-ACID CONTAINING POLYMERS AND THEIR USE IN PHOTORESISTS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2003-03-13 | — | — | WO | disclosed |
| US-20020197558-A1 | Photoacid generators for use in photoresist compositions | ARCH SPECIALTY CHEMICALS, INC. | 2002-12-26 | — | — | US | disclosed |
| WO-2002082184-A1 | SILICON-CONTAINING ACETAL PROTECTED POLYMERS AND PHOTORESISTS COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-10-17 | — | — | WO | disclosed |
| WO-2002082185-A1 | PERFLUOROALKYLSULFONIC ACID COMPOUNDS FOR PHOTORESISTS | ARCH SPECIALTY CHEMICALS, INC. (US) | 2002-10-17 | — | — | WO | disclosed |
| US-20020028409-A1 | Positive resist laminate | FUJI PHOTO FILM CO., LTD. | 2002-03-07 | — | — | US | disclosed |