SCHEMBL2009735

SCHEMBL2009735

C=C(C)C(=O)OCCOC(=O)C1(N)CC2CCC1C2

nearest known ligand 0.39

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.39
TSHR P16473 3/20 0.35
ALDH1A1 P00352 1/20 0.34
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7386383 0.79 LMNA (0.36) ALDH1A1
SCHEMBL1632303 0.74 ALDH1A1 (0.33) THRBTSHRALDH1A1
SCHEMBL1311078 0.73 ALDH1A1 (0.38) THRBTSHRALDH1A1
SCHEMBL6559249 0.73 NPSR1 (0.47) THRBTSHRALDH1A1CA1CA2
SCHEMBL11299461 0.73 ALDH1A1 (0.48) THRBTSHRALDH1A1
SCHEMBL154553 0.73 THRB (0.35) THRBTSHRALDH1A1
SCHEMBL7780069 0.72 ALDH1A1 (0.37) THRBTSHRALDH1A1
Hydrochloric Acid SCHEMBL1632301 0.72 ALDH1A1 (0.32) THRBTSHRALDH1A1
SCHEMBL6865038 0.71 ALDH1A1 (0.46) ALDH1A1
SCHEMBL6559851 0.71 NPSR1 (0.58) THRBTSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7964332-B2 Methods of forming a pattern of a semiconductor device SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-06-21 US disclosed
US-7964332-B2 Methods of forming a pattern of a semiconductor device SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-06-21 US disclosed
US-7964332-B2 Methods of forming a pattern of a semiconductor device SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-06-21 US disclosed
US-20090162796-A1 METHODS OF FORMING A PATTERN OF A SEMICONDUCTOR DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-06-25 US disclosed
US-20090162796-A1 METHODS OF FORMING A PATTERN OF A SEMICONDUCTOR DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-06-25 US disclosed
US-20090162796-A1 METHODS OF FORMING A PATTERN OF A SEMICONDUCTOR DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-06-25 US disclosed