SCHEMBL20102171

SCHEMBL20102171

C=CC(=O)OC1(c2ccccc2)CC1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TET3 O43151 3/20 0.43
KMT2A Q03164 3/20 0.43
FBXL19 Q6PCT2 3/20 0.43
CXXC5 Q7LFL8 3/20 0.43
KDM2B Q8NHM5 3/20 0.43
CXXC4 Q9H2H0 3/20 0.43
KDM2A Q9Y2K7 3/20 0.43
TET1 Q8NFU7 2/20 0.43
THRB P10828 1/20 0.40
AKR1C1 Q04828 1/20 0.39
AKT1 P31749 1/20 0.38
OPRM1 P35372 6/20 0.38
OPRD1 P41143 5/20 0.38
OPRK1 P41145 5/20 0.38
ALOX15 P16050 1/20 0.36
TSHR P16473 1/20 0.36
DRD3 P35462 1/20 0.36
TGM2 P21980 1/20 0.35
HDAC4 P56524 1/20 0.35
LMNA P02545 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20102167 0.93 AKR1C1 (0.44) TET3KMT2AFBXL19CXXC5KDM2B
SCHEMBL31564938 0.92 AKR1C1 (0.43) TET3KMT2AFBXL19CXXC5KDM2B
SCHEMBL24944254 0.89 OPRM1 (0.47) TET3KMT2AFBXL19CXXC5KDM2B
SCHEMBL4699835 0.79 AKR1C1 (0.45) KMT2AAKR1C1OPRM1OPRD1OPRK1
SCHEMBL2572169 0.76 AKR1C1 (0.42) KMT2AAKR1C1OPRM1OPRD1OPRK1
SCHEMBL10899540 0.73 TET3 (0.46) TET3KMT2AFBXL19CXXC5KDM2B
SCHEMBL27173817 0.72 LMNA (0.35) TET3KMT2AFBXL19CXXC5KDM2B
SCHEMBL28329527 0.72 HDAC9 (0.45) TET3KMT2AFBXL19CXXC5KDM2B
SCHEMBL6036843 0.72 AKR1C1 (0.52) KMT2AAKR1C1OPRM1OPRD1OPRK1
SCHEMBL6938953 0.71 OPRM1 (0.45) KMT2AAKR1C1OPRM1OPRD1OPRK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10739678-B2 Photocurable composition, pattern forming method, and method for manufacturing device FUJIFILM CORPORATION (JP) 2020-08-11 US disclosed
US-20180120698-A1 PHOTOCURABLE COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed
US-20180120698-A1 PHOTOCURABLE COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed