SCHEMBL20102167

SCHEMBL20102167

C=CC(=O)OC1(c2ccccc2)CCCC1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1C1 Q04828 1/20 0.44
KMT2A Q03164 2/20 0.41
TET3 O43151 1/20 0.41
FBXL19 Q6PCT2 1/20 0.41
CXXC5 Q7LFL8 1/20 0.41
TET1 Q8NFU7 1/20 0.41
KDM2B Q8NHM5 1/20 0.41
CXXC4 Q9H2H0 1/20 0.41
KDM2A Q9Y2K7 1/20 0.41
HDAC4 P56524 2/20 0.40
THRB P10828 1/20 0.38
MEN1 O00255 1/20 0.37
NPSR1 Q6W5P4 1/20 0.37
AKT1 P31749 1/20 0.36
OPRM1 P35372 3/20 0.36
OPRD1 P41143 3/20 0.36
OPRK1 P41145 3/20 0.36
HSD11B1 P28845 1/20 0.36
HTT P42858 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31564938 0.98 AKR1C1 (0.43) AKR1C1KMT2ATET3FBXL19CXXC5
SCHEMBL20102171 0.93 TET3 (0.43) AKR1C1KMT2ATET3FBXL19CXXC5
SCHEMBL24944254 0.86 OPRM1 (0.47) AKR1C1KMT2ATET3FBXL19CXXC5
SCHEMBL6036843 0.80 AKR1C1 (0.52) AKR1C1KMT2AHDAC4MEN1OPRM1
SCHEMBL10899540 0.80 TET3 (0.46) KMT2ATET3FBXL19CXXC5TET1
SCHEMBL9191673 0.79 AKR1C1 (0.50) AKR1C1KMT2AHDAC4MEN1OPRM1
SCHEMBL9191670 0.79 AKR1C1 (0.50) AKR1C1KMT2AHDAC4MEN1HSD11B1
SCHEMBL23762899 0.77 AKR1C1 (0.48) AKR1C1KMT2AHDAC4MEN1NPSR1
SCHEMBL11289324 0.77 AKR1C1 (0.48) AKR1C1KMT2AHDAC4MEN1OPRM1
SCHEMBL24715987 0.76 TAS1R3 (0.38) AKR1C1KMT2ATET3FBXL19CXXC5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025094825-A1 HETEROPOLYOXOMETALATE HAVING MODIFIED LACUNARY SITE, OR MIXTURE THEREOF 東京応化工業株式会社 2025-05-08 WO disclosed
US-10739678-B2 Photocurable composition, pattern forming method, and method for manufacturing device FUJIFILM CORPORATION (JP) 2020-08-11 US disclosed
US-20180120698-A1 PHOTOCURABLE COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed
US-20180120698-A1 PHOTOCURABLE COMPOSITION, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed