SCHEMBL24944254

SCHEMBL24944254

C=CC(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 5/20 0.47
TET3 O43151 2/20 0.38
KMT2A Q03164 2/20 0.38
FBXL19 Q6PCT2 2/20 0.38
CXXC5 Q7LFL8 2/20 0.38
TET1 Q8NFU7 2/20 0.38
KDM2B Q8NHM5 2/20 0.38
CXXC4 Q9H2H0 2/20 0.38
KDM2A Q9Y2K7 2/20 0.38
HTR2A P28223 1/20 0.38
TACR1 P25103 1/20 0.36
HDAC1 Q13547 1/20 0.36
THRB P10828 1/20 0.36
AKR1C1 Q04828 1/20 0.34
OPRD1 P41143 3/20 0.34
OPRK1 P41145 3/20 0.34
AKT2 P31751 1/20 0.34
CYP1A2 P05177 1/20 0.34
CYP2D6 P10635 1/20 0.34
DPP9 Q86TI2 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20102171 0.89 TET3 (0.43) OPRM1TET3KMT2AFBXL19CXXC5
SCHEMBL20102167 0.86 AKR1C1 (0.44) OPRM1TET3KMT2AFBXL19CXXC5
SCHEMBL31564938 0.84 AKR1C1 (0.43) TET3KMT2AFBXL19CXXC5TET1
SCHEMBL24944262 0.82 OPRM1 (0.45) OPRM1HTR2ATACR1HDAC1OPRD1
SCHEMBL24944237 0.82 LMNA (0.43) OPRM1KMT2AHDAC1CYP1A2CYP2D6
SCHEMBL24944587 0.82 OPRM1 (0.45) OPRM1HTR2ATACR1HDAC1OPRD1
SCHEMBL373568 0.82 OPRM1 (0.50) OPRM1HTR2ATACR1HDAC1AKR1C1
SCHEMBL24944588 0.81 OPRM1 (0.44) OPRM1KMT2AHTR2AHDAC1OPRD1
SCHEMBL26413331 0.81 OPRM1 (0.39) OPRM1HTR2ATACR1HDAC1OPRD1
SCHEMBL11602249 0.80 OPRM1 (0.50) OPRM1HTR2ATACR1HDAC1OPRD1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885TET3 22/4885KMT2A 1033/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.