SCHEMBL20102186

SCHEMBL20102186

CCc1cc(Cc2cc(C)cc(Cc3cc(C)c(O)c(CC)c3)c2O)cc(C)c1O

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SHBG P04278 1/20 0.55
DHFR P00374 2/20 0.45
AMY1A P0DUB6 1/20 0.44
CYP2C9 P11712 2/20 0.43
CYP2C19 P33261 2/20 0.43
HIF1A Q16665 2/20 0.43
HMGB1 P09429 1/20 0.43
CXCL12 P48061 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
HSPA5 P11021 2/20 0.41
CYP2D6 P10635 1/20 0.39
HSD17B10 Q99714 1/20 0.39
GABRA1 P14867 1/20 0.36
GABRB2 P47870 1/20 0.36
ALK Q9UM73 1/20 0.36
PTPN1 P18031 2/20 0.36
PTPN2 P17706 1/20 0.36
PTPN6 P29350 1/20 0.36
NR3C1 P04150 1/20 0.35
PGR P06401 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14447167 1.00 SHBG (0.55) SHBGDHFRAMY1ACYP2C9CYP2C19
SCHEMBL15830868 0.98 SHBG (0.53) SHBGDHFRAMY1ACYP2C9CYP2C19
SCHEMBL22408785 0.96 SHBG (0.50) SHBGDHFRAMY1ACYP2C9CYP2C19
SCHEMBL7899901 0.95 SHBG (0.47) SHBGDHFRAMY1ACYP2C9CYP2C19
SCHEMBL2384360 0.93 SHBG (0.63) SHBGDHFRAMY1ACYP2C9HMGB1
SCHEMBL30003742 0.93 SHBG (0.63) SHBGDHFRAMY1ACYP2C9HMGB1
SCHEMBL22408778 0.93 DHFR (0.50) SHBGDHFRAMY1ACYP2C9CYP2C19
SCHEMBL2754949 0.91 SHBG (0.60) SHBGAMY1ACYP2C9CYP2C19HIF1A
SCHEMBL2385253 0.89 SHBG (0.58) SHBGDHFRHMGB1CXCL12HSPA5
SCHEMBL4065757 0.89 SHBG (0.58) SHBGDHFRHMGB1CXCL12HSPA5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180120701-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed