SCHEMBL20125992

SCHEMBL20125992

C=CC(=O)N(CC)CCC(=O)OCC

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.39
MGAM O43451 1/20 0.38
GAA P10253 1/20 0.38
SI P14410 1/20 0.38
MGAM2 Q2M2H8 1/20 0.38
ZDHHC20 Q5W0Z9 2/20 0.36
ZDHHC2 Q9UIJ5 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
NR1I2 O75469 1/20 0.36
PGR P06401 1/20 0.36
ADORA3 P0DMS8 1/20 0.36
PTGS2 P35354 1/20 0.36
PDE4D Q08499 1/20 0.36
ALDH1A1 P00352 3/20 0.35
LMNA P02545 2/20 0.35
TRPA1 O75762 1/20 0.35
TSHR P16473 3/20 0.35
POLB P06746 1/20 0.35
ALOX5 P09917 1/20 0.35
CYP3A4 P08684 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20125991 0.88 ZDHHC20 (0.39) CYP1A2MGAMGAASIMGAM2
SCHEMBL20125965 0.87 ZDHHC20 (0.39) ZDHHC20ZDHHC2ALDH1A1TSHR
SCHEMBL20125995 0.85 ZDHHC20 (0.47) CYP1A2ZDHHC20ZDHHC2NR1I2PGR
SCHEMBL20126061 0.84 KMT2A (0.46) ZDHHC20ZDHHC2ALDH1A1LMNATSHR
SCHEMBL20125990 0.84 TSHR (0.49) ZDHHC20ZDHHC2ALDH1A1TSHR
SCHEMBL20125959 0.84 TSHR (0.46) GAAZDHHC20ZDHHC2ALDH1A1LMNA
SCHEMBL20126040 0.83 ZDHHC20 (0.55) CYP1A2ZDHHC20ZDHHC2ALDH1A1LMNA
SCHEMBL13411271 0.82 CA12 (0.42) CYP1A2MGAMGAASIMGAM2
SCHEMBL23420590 0.82 ZDHHC20 (0.50) ZDHHC20ZDHHC2TSHR
SCHEMBL20126064 0.82 ZDHHC20 (0.50) ZDHHC20ZDHHC2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112469306-B Composition, artificial nail composition, nail decorating material, artificial nail, storage container, image forming apparatus, and image forming method 株式会社理光 2024-07-05 CN disclosed
US-12023398-B2 Composition, artificial nail composition, nail decoration material, artificial nail, stored container, image forming apparatus, and image forming method RICOH COMPANY, LTD. (JP) 2024-07-02 US disclosed
US-20230135413-A1 CURABLE WATER-BASED COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE WATER-BASED COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE WATER-BASED INK, STORED CONTAINER, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING APPARATUS, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING METHOD, CURED PRODUCT, AND DECORATED BODY RICOH COMPANY, LTD. (JP) 2023-05-04 US disclosed
US-20230135413-A1 CURABLE WATER-BASED COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE WATER-BASED COMPOSITION, ACTIVE-ENERGY-RAY-CURABLE WATER-BASED INK, STORED CONTAINER, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING APPARATUS, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING METHOD, CURED PRODUCT, AND DECORATED BODY RICOH COMPANY, LTD. (JP) 2023-05-04 US disclosed
US-20230077371-A1 CURABLE COMPOSITION, CURABLE INK, COMPOSITION CONTAINER, DEVICE FOR FORMING TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE, METHOD OF FORMING TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE, CURED MATTER, AND DECORATIVE OBJECT RICOH COMPANY, LTD. (JP) 2023-03-16 US disclosed
US-11529302-B2 Composition, artificial nail composition, nail decoration material, artificial nail, stored container, image forming apparatus, and image forming method RICOH COMPANY, LTD. (JP) 2022-12-20 US disclosed
EP-3431557-B1 COMPOSITION, CURED PRODUCT, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD RICOH CO LTD (JP) 2022-01-12 EP disclosed
US-11208516-B2 Composition, cured product, storage container, image forming apparatus, and image forming method RICOH COMPANY, LTD. (JP) 2021-12-28 US disclosed
US-20210309771-A1 COMPOSITION, ARTIFICIAL NAIL COMPOSITION, NAIL DECORATION MATERIAL, ARTIFICIAL NAIL, STORED CONTAINER, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD RICOH COMPANY, LTD. (JP) 2021-10-07 US disclosed
US-11084940-B2 Composition, cured product, storage container, image forming apparatus, and image forming method RICOH COMPANY, LTD. (JP) 2021-08-10 US disclosed
US-20200038310-A1 COMPOSITION, ARTIFICIAL NAIL COMPOSITION, NAIL DECORATION MATERIAL, ARTIFICIAL NAIL, STORED CONTAINER, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD RICOH COMPANY, LTD. (JP) 2020-02-06 US disclosed
US-20200038309-A1 COMPOSITION, ARTIFICIAL NAIL COMPOSITION, NAIL DECORATION MATERIAL, ARTIFICIAL NAIL, STORED CONTAINER, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD RICOH COMPANY, LTD. (JP) 2020-02-06 US disclosed
US-20200032089-A1 COMPOSITION, CURED PRODUCT, STORAGE CONTAINER, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD RICOH COMPANY, LTD. (JP) 2020-01-30 US disclosed
US-20200032068-A1 COMPOSITION, CURED PRODUCT, STORAGE CONTAINER, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD RICOH COMPANY, LTD. (JP) 2020-01-30 US disclosed
US-20200031969-A1 COMPOSITION, CURED PRODUCT, STORAGE CONTAINER, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD RICOH COMPANY, LTD. (JP) 2020-01-30 US disclosed
US-20190284409-A1 COMPOSITION, CURED PRODUCT, COMPOSITION STORED CONTAINER, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD RICOH COMPANY, LTD. (JP) 2019-09-19 US disclosed
US-20190023924-A1 COMPOSITION, CURED PRODUCT, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD RICOH COMPANY, LTD. (JP) 2019-01-24 US disclosed
EP-3431557-A1 COMPOSITION, CURED PRODUCT, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD Ricoh Company, Limited (JP) 2019-01-23 EP disclosed
US-20180127607-A1 CURABLE COMPOSITION, CURABLE INK, ACCOMMODATING CONTAINER, IMAGE FORMING DEVICE, IMAGE FORMING METHOD, CURED MATTER, AND ACRYLAMIDE COMPOUND RICOH COMPANY, LTD. (JP) 2018-05-10 US disclosed
US-20180127607-A1 CURABLE COMPOSITION, CURABLE INK, ACCOMMODATING CONTAINER, IMAGE FORMING DEVICE, IMAGE FORMING METHOD, CURED MATTER, AND ACRYLAMIDE COMPOUND RICOH COMPANY, LTD. (JP) 2018-05-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210309771-A1 COMPOSITION, ARTIFICIAL NAIL COMPOSITION, NAIL DECORATION MATERIAL, ARTIFICIAL NAIL, STORED CONTAINER, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD NACA, PIK3C3, POLR1C CYP1A2 2068/4885MGAM 3945/4885GAA 3895/4885
US-20180127607-A1 CURABLE COMPOSITION, CURABLE INK, ACCOMMODATING CONTAINER, IMAGE FORMING DEVICE, IMAGE FORMING METHOD, CURED MATTER, AND ACRYLAMIDE COMPOUND CRYAA, CDKN1A, ACR CYP1A2 1073/4885MGAM 3652/4885GAA 3859/4885
US-20200038309-A1 COMPOSITION, ARTIFICIAL NAIL COMPOSITION, NAIL DECORATION MATERIAL, ARTIFICIAL NAIL, STORED CONTAINER, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD NACA, PIK3C3, DPM1 CYP1A2 769/4885MGAM 3729/4885GAA 4484/4885
US-20200038310-A1 COMPOSITION, ARTIFICIAL NAIL COMPOSITION, NAIL DECORATION MATERIAL, ARTIFICIAL NAIL, STORED CONTAINER, IMAGE FORMING APPARATUS, AND IMAGE FORMING METHOD NACA, PIK3C3, ACR CYP1A2 1611/4885MGAM 3156/4885GAA 4424/4885
US-11529302-B2 Composition, artificial nail composition, nail decoration material, artificial nail, stored container, image forming apparatus, and image forming method NACA, PIK3C3, ACR CYP1A2 1611/4885MGAM 3156/4885GAA 4424/4885
US-12023398-B2 Composition, artificial nail composition, nail decoration material, artificial nail, stored container, image forming apparatus, and image forming method NACA, PIK3C3, POLR1C CYP1A2 2068/4885MGAM 3945/4885GAA 3895/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.