Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA9 | Q16790 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30173263 | 0.84 | — | — | |
| SCHEMBL20130845 | 0.79 | CA12 (0.36) | CA12CA1CA9 | |
| SCHEMBL15605734 | 0.77 | CA12 (0.34) | CA12CA1CA9 | |
| SCHEMBL25280422 | 0.75 | — | — | |
| SCHEMBL15605797 | 0.73 | ADRB2 (0.35) | CA12CA1CA9 | |
| SCHEMBL15605732 | 0.73 | CA12 (0.32) | CA12CA1CA9 | |
| SCHEMBL15605738 | 0.73 | CA12 (0.32) | CA12CA1CA9 | |
| SCHEMBL19973288 | 0.73 | — | — | |
| SCHEMBL20130873 | 0.71 | CA12 (0.31) | CA12CA1CA9 | |
| SCHEMBL20130863 | 0.71 | CA12 (0.31) | CA12CA1CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025029888-A1 | METHODS TO IMPROVE THERMAL STABILITY AND FILM CRACKING MARGIN FOR LOW TEMPERATURE HIGH TENSILE SILICON NITRIDE THIN FILMS | LAM RESEARCH CORPORATION (US) | 2025-02-06 | — | — | WO | disclosed |
| WO-2024254272-A1 | METHODS TO PROVIDE VOID FREE TRENCH FILL FOR LOGIC AND MEMORY APPLICATIONS | LAM RESEARCH CORPORATION (US) | 2024-12-12 | — | — | WO | disclosed |
| WO-2024102763-A1 | A ROBUST ICEFILL METHOD TO PROVIDE VOID FREE TRENCH FILL FOR LOGIC AND MEMORY APPLICATIONS | LAM RESEARCH CORPORATION (US) | 2024-05-16 | — | — | WO | disclosed |
| EP-4367709-A1 | PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS | Lam Research Corporation (US) | 2024-05-15 | — | — | EP | disclosed |
| WO-2023230296-A1 | SINGLE WAFER REACTOR, LOW TEMPERATURE, THERMAL SILICON NITRIDE DEPOSITION | LAM RESEARCH CORPORATION (US) | 2023-11-30 | — | — | WO | disclosed |
| WO-2023205284-A1 | LATERAL GAP FILL | LAM RESEARCH CORPORATION (US) | 2023-10-26 | — | — | WO | disclosed |
| WO-2023178273-A1 | REDUCING CAPACITANCE IN SEMICONDUCTOR DEVICES | LAM RESEARCH CORPORATION (US) | 2023-09-21 | — | — | WO | disclosed |
| WO-2023164717-A1 | SURFACE INHIBITION ATOMIC LAYER DEPOSITION | LAM RESEARCH CORPORATION (US) | 2023-08-31 | — | — | WO | disclosed |
| WO-2023159012-A1 | HIGH PRESSURE INERT OXIDATION AND IN-SITU ANNEALING PROCESS TO IMPROVE FILM SEAM QUALITY AND WER | LAM RESEARCH CORPORATION (US) | 2023-08-24 | — | — | WO | disclosed |
| WO-2023114401-A1 | ATOMIC LAYER DEPOSITION PULSE SEQUENCE ENGINEERING FOR IMPROVED CONFORMALITY FOR LOW TEMPERATURE PRECURSORS | LAM RESEARCH CORPORATION (US) | 2023-06-22 | — | — | WO | disclosed |
| WO-2023114870-A1 | HIGH PRESSURE PLASMA INHIBITION | LAM RESEARCH CORPORATION (US) | 2023-06-22 | — | — | WO | disclosed |
| WO-2023114898-A1 | METHOD TO SMOOTH SIDEWALL ROUGHNESS AND MAINTAIN REENTRANT STRUCTURES DURING DIELECTRIC GAP FILL | LAM RESEARCH CORPORATION (US) | 2023-06-22 | — | — | WO | disclosed |
| WO-2023076524-A1 | ATOMIC LAYER DEPOSITION SEAM REDUCTION | LAM RESEARCH CORPORATION (US) | 2023-05-04 | — | — | WO | disclosed |
| WO-2023283144-A1 | PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS | LAM RESEARCH CORPORATION (US) | 2023-01-12 | — | — | WO | disclosed |
| US-10703915-B2 | Compositions and methods for the deposition of silicon oxide films | VERSUM MATERIALS US, LLC (US) | 2020-07-07 | — | — | US | disclosed |
| US-20200040192-A9 | Compositions and Methods for the Deposition of Silicon Oxide Films | VERSUM MATERIALS US, LLC (US) | 2020-02-06 | — | — | US | disclosed |
| US-20180127592-A1 | Compositions and Methods for the Deposition of Silicon Oxide Films | VERSUM MATERIALS US, LLC (US) | 2018-05-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180127592-A1 | Compositions and Methods for the Deposition of Silicon Oxide Films | SEPTIN9, SGMS1, SGMS2 | CA12 62/4885CA1 42/4885CA9 130/4885 |
| US-20200040192-A9 | Compositions and Methods for the Deposition of Silicon Oxide Films | SEPTIN9, SGMS1, SGMS2 | CA12 62/4885CA1 42/4885CA9 130/4885 |
| US-10703915-B2 | Compositions and methods for the deposition of silicon oxide films | SEPTIN9, SGMS1, SGMS2 | CA12 62/4885CA1 42/4885CA9 130/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.