SCHEMBL20143799

SCHEMBL20143799

CC(C)OC(C)(N)CC(C)(C)C(=O)C(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23950402 0.76
SCHEMBL23974367 0.74 TSHR (0.31)
SCHEMBL22013342 0.72 GRM4 (0.31)
SCHEMBL10074939 0.71 L3MBTL1 (0.31)
SCHEMBL15113288 0.68 TSHR (0.32)
SCHEMBL25530283 0.67
SCHEMBL4021346 0.65
SCHEMBL19787617 0.65 ALDH1A1 (0.33)
SCHEMBL25979247 0.64 KDM4E (0.43)
SCHEMBL23056883 0.64 PIK3CD (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9972413-B2 Metal particle dispersion for electroconductive substrates, method for producing the same, and method for producing an electroconductive substrate DAI NIPPON PRINTING CO., LTD. (JP) 2018-05-15 US disclosed