Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | P2RX7 | Q99572 | 1/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.40 |
| ▸ | CETP | P11597 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 2/20 | 0.37 |
| ▸ | MAPT | P10636 | 2/20 | 0.37 |
| ▸ | XBP1 | P17861 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.33 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.33 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.33 |
| ▸ | RELA | Q04206 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4103952 | 0.92 | KMT2A (0.43) | P2RX7CETPGAAMAPTXBP1 | |
| SCHEMBL4100310 | 0.85 | L3MBTL1 (0.43) | P2RX7POLBL3MBTL1CETPMAPT | |
| SCHEMBL5066637 | 0.83 | GAA (0.36) | P2RX7POLBCETPGAAMAPT | |
| SCHEMBL7210555 | 0.82 | MAPT (0.39) | POLBL3MBTL1GAAMAPTXBP1 | |
| SCHEMBL4105640 | 0.80 | CYP2D6 (0.37) | POLBL3MBTL1GAAMAPTXBP1 | |
| SCHEMBL4100519 | 0.79 | KMT2A (0.46) | P2RX7L3MBTL1CETPGAAMAPT | |
| SCHEMBL3198476 | 0.79 | TSHR (0.45) | P2RX7GAAKDM4ESMN1; SMN2MEN1 | |
| SCHEMBL3198481 | 0.79 | P2RX7 (0.41) | P2RX7L3MBTL1MAPTKDM4EALDH1A1 | |
| SCHEMBL5450441 | 0.78 | P2RX7 (0.40) | P2RX7POLBCETPMAPTKDM4E | |
| SCHEMBL18938394 | 0.77 | P2RX7 (0.41) | P2RX7POLBCETPMAPTKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 95 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7101496-B2 | Thermoplastic norbornene resin based optical film | JSR CORPORATION (JP) | 2006-09-05 | — | — | US | claimed |
| US-9417477-B2 | Polarizing plate and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2016-08-16 | — | — | US | disclosed |
| US-20150146140-A1 | POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2015-05-28 | — | — | US | disclosed |
| EP-1884519-B1 | METAL HYDRIDE COMPLEX, METHOD OF HYDROGENATING RING-OPENING POLYMERIZATION POLYMER OF CYCLOOLEFIN, AND PROCESS FOR PRODUCING PRODUCT OF HYDROGENATION OF RING-OPENING POLYMERIZATION POLYMER OF CYCLOOLEFIN | JSR CORP (JP) | 2014-03-19 | — | — | EP | disclosed |
| US-8089593-B2 | Optical resin film, optical compensation sheet, polarizing plate and liquid crystal display | FUJIFILM CORPORATION (JP) | 2012-01-03 | — | — | US | disclosed |
| EP-2322960-A1 | Optical film, polarizer and liquid crystal display | JSR Corporation (JP) | 2011-05-18 | — | — | EP | disclosed |
| US-7910674-B2 | Especially a copolymer of norbornene and/or alkylnorbornene and (trialkoxysilylalkyl)norbornene; optical articles such as ophthalmic lenses, wave guides, optical fibers, and optical adhesives | PROMERUS, LLC (US) | 2011-03-22 | — | — | US | disclosed |
| EP-1164434-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-10-06 | — | — | EP | disclosed |
| US-7719644-B2 | Optical compensation sheet, polarizing plate and liquid crystal display | FUJIFILM CORPORATION (JP) | 2010-05-18 | — | — | US | disclosed |
| US-7675587-B2 | Polarizing plate and process for producing the same | JSR CORPORATION (JP) | 2010-03-09 | — | — | US | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-1162506-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-12 | — | — | EP | disclosed |
| US-6322949-B2 | SULFONIUM COMPOUND AS PHOTOACID GENERATOR | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-11-27 | — | — | US | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-6180316-B1 | SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-01-30 | — | — | US | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |