Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | PPARG | P37231 | 1/20 | 0.32 |
| ▸ | PPARA | Q07869 | 1/20 | 0.32 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.30 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | JAK2 | O60674 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29480009 | 0.91 | RIPK1 (0.36) | ALDH1A1TP53PPARGPPARA | |
| SCHEMBL21044975 | 0.90 | ALDH1A1 (0.33) | ALDH1A1TP53PPARGPPARASOAT1 | |
| SCHEMBL19970905 | 0.88 | ALDH1A1 (0.31) | ALDH1A1TP53 | |
| SCHEMBL21044981 | 0.88 | RIPK1 (0.37) | — | |
| SCHEMBL21044993 | 0.86 | RIPK1 (0.32) | — | |
| SCHEMBL21044916 | 0.84 | ALDH1A1 (0.31) | ALDH1A1TP53 | |
| SCHEMBL29479959 | 0.83 | ALDH1A1 (0.38) | ALDH1A1TP53NPC1JAK2RAB9A | |
| SCHEMBL29479995 | 0.82 | ALDH1A1 (0.35) | ALDH1A1TP53NPC1JAK2RAB9A | |
| SCHEMBL29479974 | 0.82 | S1PR1 (0.42) | ALDH1A1TP53NPC1JAK2RAB9A | |
| SCHEMBL21044938 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3893054-B1 | PATTERN FORMING METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, AND DEVICE | FUJIFILM CORP (JP) | 2026-05-06 | — | — | EP | disclosed |
| US-12393116-B2 | Pattern forming method, photosensitive resin composition, cured film, laminate, and device | FUJIFILM CORPORATION (JP) | 2025-08-19 | — | — | US | disclosed |
| EP-3893053-B1 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, MULTILAYER BODY AND DEVICE | FUJIFILM CORP (JP) | 2025-01-22 | — | — | EP | disclosed |
| CN-114402256-A | Organic film, method for producing same, composition, laminate, and semiconductor device | 富士胶片株式会社 | 2022-04-26 | — | — | CN | disclosed |
| US-20210197447-A1 | Method for Making an Object | PHOTOCENTRIC LIMITED (GB) | 2021-07-01 | — | — | US | disclosed |
| EP-3295246-B1 | METHOD FOR MAKING AN OBJECT | PHOTOCENTRIC LTD (GB) | 2019-05-01 | — | — | EP | disclosed |
| US-20180141268-A1 | Method for Making an Object | PHOTOCENTRIC LIMITED (GB) | 2018-05-24 | — | — | US | disclosed |