SCHEMBL20169571

SCHEMBL20169571

Oc1ccc2ccccc2c1-c1c(O)ccc2ccc(-c3ccc4ccc(Oc5ccc6ccccc6c5)cc4c3)cc12

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALOX5 P09917 3/20 0.50
▸ ESR1 P03372 3/20 0.44
▸ ESR2 Q92731 3/20 0.44
▸ HSD17B1 P14061 5/20 0.43
▸ HSD17B2 P37059 5/20 0.43
▸ CYP1A2 P05177 3/20 0.43
▸ CYP3A4 P08684 3/20 0.43
▸ CYP2D6 P10635 3/20 0.43
▸ CYP2C9 P11712 3/20 0.43
▸ CYP2B6 P20813 3/20 0.43
▸ CYP2C19 P33261 3/20 0.43
▸ ACMSD Q8TDX5 1/20 0.43
▸ MEN1 O00255 1/20 0.42
▸ MAPT P10636 1/20 0.42
▸ KMT2A Q03164 1/20 0.42
▸ PTPN22 Q9Y2R2 1/20 0.39
▸ HDAC4 P56524 1/20 0.38
▸ HDAC2 Q92769 1/20 0.38
▸ HDAC8 Q9BY41 1/20 0.38
▸ CDK4 P11802 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18736016 0.86 ALOX5 (0.66) ALOX5ESR1ESR2HSD17B1HSD17B2
SCHEMBL13871467 0.80 HSD17B1 (0.46) ESR1ESR2HSD17B1HSD17B2CYP1A2
SCHEMBL30874112 0.80 ALOX5 (0.66) ALOX5ESR1ESR2HSD17B1HSD17B2
SCHEMBL22795574 0.80 ALOX5 (0.60) ALOX5ESR1ESR2HSD17B1HSD17B2
SCHEMBL25634037 0.79 ALOX5 (0.53) ALOX5ESR1ESR2HSD17B1HSD17B2
SCHEMBL25060829 0.79 ALOX5 (0.59) ALOX5ESR1ESR2HSD17B1HSD17B2
SCHEMBL13871471 0.78 HSD17B1 (0.47) ESR1ESR2HSD17B1HSD17B2CYP1A2
SCHEMBL13871469 0.78 HSD17B1 (0.47) ESR1ESR2HSD17B1HSD17B2CYP1A2
SCHEMBL24589226 0.77 MEN1 (0.45) ALOX5ESR1ESR2HSD17B1HSD17B2
SCHEMBL21360075 0.74 ESR2 (0.62) ALOX5ESR1ESR2HSD17B1HSD17B2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9977330-B2 Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-22 — — US disclosed
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