Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL161518 | 0.81 | THRB (0.38) | THRBCYP2C9EPHX1EPHX2HSD11B1 | |
| SCHEMBL6742682 | 0.80 | THRB (0.36) | THRBCYP2C9EPHX1EPHX2HSD11B1 | |
| SCHEMBL2827411 | 0.80 | SMN1; SMN2 (0.35) | THRBCYP2C9EPHX1EPHX2 | |
| SCHEMBL3929216 | 0.79 | ALDH1A1 (0.38) | THRBCYP2C9EPHX1EPHX2 | |
| SCHEMBL28396623 | 0.78 | THRB (0.32) | THRBCYP2C9EPHX1EPHX2HSD11B1 | |
| SCHEMBL7523676 | 0.76 | KMT2A (0.32) | EPHX2HSD11B1 | |
| SCHEMBL7734535 | 0.75 | EPHX1 (0.35) | THRBCYP2C9EPHX1EPHX2HSD11B1 | |
| Methacrylic Acid SCHEMBL30730749 | 0.71 | NPC1 (0.31) | THRBCYP2C9EPHX1EPHX2 | |
| Methacrylic Acid SCHEMBL1821222 | 0.71 | NPC1 (0.31) | THRBCYP2C9EPHX1EPHX2 | |
| SCHEMBL27976720 | 0.68 | MAPK1 (0.42) | CYP2C9EPHX2HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10670965-B2 | Polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-06-02 | — | — | US | claimed |
| US-9983477-B2 | Polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-05-29 | — | — | US | claimed |
| EP-2527380-B1 | Photosensitive compositions | ROHM & HAAS ELECT MAT (US) | 2013-12-18 | — | — | EP | claimed |
| US-8507176-B2 | Photosensitive compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2013-08-13 | — | — | US | claimed |
| EP-2341089-B1 | Photosensitive compositions | ROHM & HAAS ELECT MAT (US) | 2013-02-13 | — | — | EP | claimed |
| US-20110269074-A1 | NOVEL POLYMERS AND PHOTORESIST COMPOSITIONS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-11-03 | — | — | US | claimed |
| EP-2372456-A2 | Novel polymers and photoresist compositions | Rohm and Haas Electronic Materials LLC (US) | 2011-10-05 | — | — | EP | claimed |
| US-20110236823-A1 | NOVEL POLYMERS AND PHOTORESIST COMPOSITIONS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-09-29 | — | — | US | claimed |
| EP-2341089-A1 | Photosensitive compositions | Rohm and Haas Electronic Materials LLC (US) | 2011-07-06 | — | — | EP | claimed |
| US-20110159429-A1 | PHOTOSENSITIVE COMPOSITIONS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-06-30 | — | — | US | claimed |
| US-7838199-B2 | Polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-11-23 | — | — | US | claimed |
| US-20080206671-A1 | Novel polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-08-28 | — | — | US | claimed |
| US-10670965-B2 | Polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-06-02 | — | — | US | disclosed |
| EP-2597518-B1 | Compositions and antireflective coatings for photolithography | DOW GLOBAL TECHNOLOGIES LLC (US) | 2016-12-07 | — | — | EP | disclosed |
| US-9011591-B2 | Compositions and antireflective coatings for photolithography | DOW GLOBAL TECHNOLOGIES LLC (US) | 2015-04-21 | — | — | US | disclosed |
| US-20150037540-A1 | TEMPLATE, A METHOD OF PROCESSING A TEMPLATE, A METHOD OF PRODUCING A PATTERN, AND RESIST | KABUSHIKI KAISHA TOSHIBA (JP) | 2015-02-05 | — | — | US | disclosed |
| WO-2009019574-A1 | PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-02-12 | — | — | WO | disclosed |
| US-20090042148-A1 | Photoresist Composition for Deep UV and Process Thereof | AZ ELECTRONIC MATERIALS USA CORP. | 2009-02-12 | — | — | US | disclosed |
| US-20020187420-A1 | Novel copolymers and photoresist compositions | SHIPLEY COMPANY, L.L.C. | 2002-12-12 | — | — | US | disclosed |
| WO-2002069044-A2 | POLYMERS AND PHOTORESIST COMPOSITIONS | SHIPLEY COMPANY, L.L.C. (US) | 2002-09-06 | — | — | WO | disclosed |