Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | GLA | P06280 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2019240 | 0.80 | THRB (0.32) | THRBCYP2C9EPHX1EPHX2 | |
| SCHEMBL28088722 | 0.79 | ALDH1A1 (0.38) | THRBCYP2C9EPHX1EPHX2GAA | |
| SCHEMBL4579818 | 0.79 | TSHR (0.35) | SMN1; SMN2POLBEPHX2 | |
| SCHEMBL7523676 | 0.78 | KMT2A (0.32) | SMN1; SMN2EPHX2ALDH1A1 | |
| Methacrylic Acid SCHEMBL27952368 | 0.74 | MAPT (0.31) | MAPTGLATHRBCYP2C9EPHX1 | |
| SCHEMBL19898983 | 0.71 | HSD11B1 (0.34) | ALDH1A1 | |
| SCHEMBL11855399 | 0.69 | EPHX1 (0.35) | SMN1; SMN2EPHX1EPHX2ALDH1A1 | |
| Methacrylic Acid SCHEMBL12802644 | 0.69 | EPHX2 (0.38) | GLATHRBCYP2C9EPHX1EPHX2 | |
| Bicarbonate SCHEMBL7739524 | 0.67 | GLA (0.33) | SMN1; SMN2MAPTGLATHRBCYP2C9 | |
| Bicarbonate SCHEMBL7733365 | 0.67 | GLA (0.33) | SMN1; SMN2MAPTGLATHRBCYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2267532-B1 | Photoacid generators and photoresists comprising same | ROHM & HAAS ELECT MAT (US) | 2015-08-19 | — | — | EP | disclosed |
| US-8338077-B2 | Photoacid generators and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-12-25 | — | — | US | disclosed |
| EP-2267532-A1 | Photoacid generators and photoresists comprising same | Rohm and Haas Electronic Materials, L.L.C. (US) | 2010-12-29 | — | — | EP | disclosed |
| US-20100323294-A1 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-12-23 | — | — | US | disclosed |
| US-20100297851-A1 | COMPOSITIONS AND METHODS FOR MULTIPLE EXPOSURE PHOTOLITHOGRAPHY | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-11-25 | — | — | US | disclosed |
| US-7700256-B2 | Phenolic/alicyclic copolymers and photoresists | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-04-20 | — | — | US | disclosed |
| US-7208261-B2 | Polymers, processes for polymer synthesis and photoresist compositions | SHIPLEY COMPANY, L.L.C. (US) | 2007-04-24 | — | — | US | disclosed |
| US-20050186507-A1 | Photoresist composition | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2005-08-25 | — | — | US | disclosed |
| US-6849374-B2 | Photoacid generators and photoresists comprising same | SHIPLEY COMPANY, L.L.C. (US) | 2005-02-01 | — | — | US | disclosed |
| US-6841331-B2 | Polymers, processes for polymer synthesis and photoresist compositions | SHIPLEY COMPANY, L.L.C. (US) | 2005-01-11 | — | — | US | disclosed |
| US-6492086-B1 | TERPOLYMERS OF M- AND P-HYDROXYSTYRENE AND ACRYLIC ESTER OF ALKYLADAMANTYL, ETHYLFENCYL, TRICYCLO DECANYL, OR PINANYL GROUP; IMAGING AT SHORT WAVELENGTHS; HIGH RESOLUTION RELIEF IMAGES | SHIPLEY COMPANY, L.L.C. | 2002-12-10 | — | — | US | disclosed |
| US-6482567-B1 | Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same | SHIPLEY COMPANY, L.L.C. | 2002-11-19 | — | — | US | disclosed |
| WO-2002069040-A1 | NOVEL POLYMERS, PROCESSES FOR POLYMER SYNTHESIS AND PHOTORESIST COMPOSITIONS | SHIPLEY COMPANY, LLC (US) | 2002-09-06 | — | — | WO | disclosed |
| WO-2002069039-A2 | PHOTOACID GENERATOR SYSTEMS FOR SHORT WAVELENGTH IMAGING | SHIPLEY COMPANY, L.L.C. (US) | 2002-09-06 | — | — | WO | disclosed |
| WO-2002042845-A2 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-05-30 | — | — | WO | disclosed |
| US-20020058198-A1 | Fluorinated phenolic polymers and photoresist compositions comprising same | SHIPLEY COMPANY, L.L.C. | 2002-05-16 | — | — | US | disclosed |
| WO-2002021212-A2 | FLUORINATED PHENOLIC POLYMERS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-03-14 | — | — | WO | disclosed |
| WO-2002019033-A2 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-03-07 | — | — | WO | disclosed |
| WO-2002017019-A2 | OXIME SULFONATE AND N-OXYIMIDOSULFONATE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-02-28 | — | — | WO | disclosed |
| EP-1091250-A1 | Copolymers having phenol groups and alicyclic groups and photoresist compositions comprising same | Shipley Company LLC (US) | 2001-04-11 | — | — | EP | disclosed |