SCHEMBL18898014

SCHEMBL18898014

CCC(C)(I)C(=O)OCc1cccc2c(O)c(CC(I)(CC)C(=O)OCCc3cccc4c(O)cccc34)ccc12

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
▸ S1PR1 P21453 1/20 0.30
▸ S1PR3 Q99500 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20215425 0.84 TYR (0.36) S1PR1S1PR3
SCHEMBL18671832 0.82 CDC25B (0.37) —
SCHEMBL18671830 0.78 IDO1 (0.35) —
SCHEMBL14461688 0.73 TYR (0.38) S1PR1S1PR3
SCHEMBL19222211 0.73 ESR1 (0.35) —
SCHEMBL18400983 0.72 TYR (0.40) —
SCHEMBL18671963 0.71 KDM4E (0.43) —
SCHEMBL8738362 0.71 CDC25B (0.39) —
SCHEMBL15189314 0.71 CDC25B (0.39) —
SCHEMBL20215428 0.70 CDC25B (0.45) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9665002-B2 Onium salt compound, resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-30 — — US disclosed
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