SCHEMBL2037640

SCHEMBL2037640

CCC[SiH](C)N(C)[Si](C)(C)CCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL425379 0.78
SCHEMBL1525979 0.78
SCHEMBL1525978 0.78
SCHEMBL423756 0.75 DNM1 (0.32)
SCHEMBL424514 0.75 DNM1 (0.32)
SCHEMBL1204402 0.75 DNM1 (0.32)
SCHEMBL11969452 0.75 DNM1 (0.32)
SCHEMBL426518 0.75 DNM1 (0.32)
SCHEMBL4922190 0.68
SCHEMBL4927487 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240218217-A1 THERMOSETTING RESIN COMPOSITION AND INSULATING ADHESIVE FILM THEREOF SHENGYI TECHNOLOGY CO., LTD. (CN) 2024-07-04 US claimed
US-20260109849-A1 EPOXY RESIN COMPOSITION, RESIN PASTE, FILM-TYPE ADHESIVE, PRINTED WIRING BOARD, SEMICONDUCTOR CHIP PACKAGE, AND ELECTRONIC DEVICE ASAHI KASEI KABUSHIKI KAISHA (JP) 2026-04-23 US disclosed
WO-2025100081-A1 COMPOSITION, EPOXY RESIN COMPOSITION, FILM, PRINTED WIRING BOARD, SEMICONDUCTOR CHIP PACKAGE, AND ELECTRONIC DEVICE 旭化成株式会社 2025-05-15 WO disclosed
US-12286541-B2 Surface-treated sol-gel silica and method for producing same TOKUYAMA CORPORATION (JP) 2025-04-29 US disclosed
WO-2025009354-A1 EPOXY RESIN COMPOSITION, RESIN PASTE, FILM-TYPE ADHESIVE, PRINTED WIRING BOARD, SEMICONDUCTOR CHIP PACKAGE, AND ELECTRONIC DEVICE 旭化成株式会社 2025-01-09 WO disclosed
US-20240309214-A1 METHOD FOR MANUFACTURING SURFACE-TREATED SOL-GEL SILICA PARTICLE, SURFACE-TREATED SOL-GEL SILICA PARTICLE, AND TONER EXTERNAL ADDITIVE FOR ELECTROSTATIC CHARGE IMAGE DEVELOPMENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-09-19 US disclosed
US-20240218217-A1 THERMOSETTING RESIN COMPOSITION AND INSULATING ADHESIVE FILM THEREOF SHENGYI TECHNOLOGY CO., LTD. (CN) 2024-07-04 US disclosed
EP-4299518-A1 SURFACE-TREATED SOL-GEL SILICA PARTICLE MANUFACTURING METHOD, SURFACE-TREATED SOL-GEL SILICA PARTICLES, AND TONER EXTERNAL ADDITIVE FOR ELECTROSTATIC CHARGE IMAGE DEVELOPMENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-03 EP disclosed
CN-115298137-B Method for producing surface-treated silica powder 株式会社德山 2023-12-19 CN disclosed
CN-116897139-A Method for producing surface-treated sol-gel silica particles, and toner external additive for developing electrostatic images 信越化学工业株式会社 2023-10-17 CN disclosed
EP-2509710-B1 POLYMERIC HYBRID ORGANOMETALLOGLASS ENVONT LLC (US) 2015-01-21 EP disclosed
US-8920685-B2 Nanoparticle-resin composition, nanoparticle-resin composite, and method of making nanoparticle-resin composite SAMSUNG ELECTRONICS CO., LTD. (KR) 2014-12-30 US disclosed
CN-104045976-A Resin composition AJINOMOTO KK 2014-09-17 CN disclosed
CN-104053721-A Resin composition AJINOMOTO KK 2014-09-17 CN disclosed
CN-103890088-A Resin composition AJINOMOTO KK 2014-06-25 CN disclosed
CN-103374219-A Resin composition AJINOMOTO KK 2013-10-30 CN disclosed
US-20130004778-A1 POLYMERIC HYBRID ORGANOMETALLOGLASS ENVONT LLC 2013-01-03 US disclosed
EP-2509710-A2 POLYMERIC HYBRID ORGANOMETALLOGLASS Envont LLC (US) 2012-10-17 EP disclosed
US-20110240931-A1 NANOPARTICLE-RESIN COMPOSITION, NANOPARTICLE-RESIN COMPOSITE, AND METHOD OF MAKING NANOPARTICLE-RESIN COMPOSITE SAMSUNG ELECTRONICS CO., LTD (KR) 2011-10-06 US disclosed
WO-2011072045-A2 POLYMERIC HYBRID ORGANOMETALLOGLASS ENVONT LLC (US) 2011-06-16 WO disclosed