Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.46 |
| ▸ | MEN1 | O00255 | 2/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.46 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.46 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.46 |
| ▸ | PKM | P14618 | 1/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.46 |
| ▸ | PRCP | P42785 | 1/20 | 0.46 |
| ▸ | TMEM97 | Q5BJF2 | 1/20 | 0.46 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.46 |
| ▸ | GAA | P10253 | 2/20 | 0.45 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.45 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.45 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | CNR1 | P21554 | 2/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL501793 | 0.98 | ATM (0.48) | ATMALDH1A1KMT2AMEN1CYP1A2 | |
| SCHEMBL1377797 | 0.92 | ATM (0.50) | ATMALDH1A1KMT2AMEN1CYP1A2 | |
| SCHEMBL26844154 | 0.91 | EPHX2 (0.51) | ALDH1A1KMT2AMEN1PKMGAA | |
| SCHEMBL12120113 | 0.87 | ALDH1A1 (0.47) | ALDH1A1KMT2AMEN1MAPK1 | |
| SCHEMBL12120106 | 0.87 | ALDH1A1 (0.47) | ALDH1A1KMT2AMEN1MAPK1 | |
| SCHEMBL18023845 | 0.86 | ATM (0.46) | ATMALDH1A1KMT2ACYP1A2GAA | |
| SCHEMBL22878181 | 0.85 | ATM (0.45) | ATMALDH1A1KMT2AMEN1CYP1A2 | |
| SCHEMBL26920152 | 0.84 | ALDH1A1 (0.45) | ALDH1A1GAAEPHX1EPHX2MAPK1 | |
| Hydrochloric Acid SCHEMBL17271473 | 0.84 | ALDH1A1 (0.45) | ATMALDH1A1KMT2AMEN1CYP1A2 | |
| SCHEMBL17285898 | 0.84 | SMN1; SMN2 (0.45) | ATMALDH1A1KMT2ACYP1A2GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 365 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2608669-A1 | NOVEL PYRAZOLO[1,5-a]PYRIMIDINE DERIVATIVES AS mTOR INHIBITORS | Merck Sharp & Dohme Corp. (US) | 2013-07-03 | — | — | EP | claimed |
| WO-2012027236-A1 | NOVEL PYRAZOLO[1,5-a]PYRIMIDINE DERIVATIVES AS mTOR INHIBITORS | SCHERING CORPORATION (US) | 2012-03-01 | — | — | WO | claimed |
| CN-119156440-A | Cleaning agent, cleaning method and replenishing liquid | MEC股份有限公司 | 2024-12-17 | — | — | CN | disclosed |
| US-12036025-B2 | Bio-electrode, method for manufacturing bio-electrode, and method for measuring biological signal | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12036025-B2 | Bio-electrode, method for manufacturing bio-electrode, and method for measuring biological signal | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-16 | — | — | US | disclosed |
| US-20240215891-A1 | Bio-Electrode Composition, Bio-Electrode, And Method For Manufacturing Bio-Electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240215891-A1 | Bio-Electrode Composition, Bio-Electrode, And Method For Manufacturing Bio-Electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240215890-A1 | Bio-Electrode, Bio-Electrode Composition, And Method For Manufacturing Bio-Electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-07-04 | — | — | US | disclosed |
| EP-4306558-A1 | BIOELECTRODE, PRODUCTION METHOD FOR BIOELECTRODE, AND MEASUREMENT METHOD FOR BIOSIGNALS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-17 | — | — | EP | disclosed |
| US-11783958-B2 | Conductive wiring material composition, conductive wiring substrate and method for producing conductive wiring substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-10 | — | — | US | disclosed |
| US-11783958-B2 | Conductive wiring material composition, conductive wiring substrate and method for producing conductive wiring substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-10 | — | — | US | disclosed |
| US-20080026331-A1 | Lactone-containing compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-01-31 | — | — | US | disclosed |
| US-20080008962-A1 | Polymerizable ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-01-10 | — | — | US | disclosed |
| US-20080008962-A1 | Polymerizable ester compounds, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-01-10 | — | — | US | disclosed |
| US-20070298352-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-27 | — | — | US | disclosed |
| US-20070275326-A1 | Resist protective film composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-11-29 | — | — | US | disclosed |
| US-20070275326-A1 | Resist protective film composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-11-29 | — | — | US | disclosed |
| US-20070099114-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-03 | — | — | US | disclosed |
| US-20070099114-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-03 | — | — | US | disclosed |
| US-20070099114-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070298352-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | HCN3, ASIC3, TST | ATM 1421/4885ALDH1A1 2781/4885KMT2A 83/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.