⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL989309 | 1.00 | — | — | |
| SCHEMBL2680077 | 0.98 | CYP2C19 (0.31) | — | |
| SCHEMBL3292924 | 0.98 | CYP2C19 (0.31) | — | |
| SCHEMBL3288533 | 0.98 | CYP2C19 (0.31) | — | |
| SCHEMBL479236 | 0.98 | CYP2C19 (0.31) | — | |
| SCHEMBL3291143 | 0.98 | CYP2C19 (0.31) | — | |
| SCHEMBL6522429 | 0.98 | CYP2C19 (0.31) | — | |
| SCHEMBL2680377 | 0.98 | CYP2C19 (0.31) | — | |
| SCHEMBL3288490 | 0.96 | — | — | |
| SCHEMBL3286642 | 0.92 | CD81 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2970538-B1 | POLYMERIZATION PROCESS PROTECTION MEANS | DUPONT ELECTRONICS INC (US) | 2021-10-20 | — | — | EP | disclosed |
| US-10626287-B2 | Resin composition for underlayer film formation, layered product, method for forming pattern, and process for producing device | FUJIFILM CORPORATION (JP) | 2020-04-21 | — | — | US | disclosed |
| US-10246605-B2 | Resin composition for underlayer film formation, layered product, method for forming pattern, imprint forming kit, and process for producing device | FUJIFILM CORPORATION (JP) | 2019-04-02 | — | — | US | disclosed |
| US-10191375-B2 | Resin composition for underlayer film formation, layered product, method for forming pattern, imprint forming kit and process for producing device | FUJIFILM CORPORATION (JP) | 2019-01-29 | — | — | US | disclosed |
| US-20180002561-A1 | RESIN COMPOSITION FOR UNDERLAYER FILM FORMATION, IMPRINT FORMING KIT, LAMINATE, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING DEVICE | FUJIFILM CORPORATION (JP) | 2018-01-04 | — | — | US | disclosed |
| US-9733564-B2 | Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-08-15 | — | — | US | disclosed |
| US-20170158905-A1 | RESIN COMPOSITION FOR UNDERLAYER FILM FORMATION, LAYERED PRODUCT, METHOD FOR FORMING PATTERN, IMPRINT FORMING KIT, AND PROCESS FOR PRODUCING DEVICE | FUJIFILM CORPORATION (JP) | 2017-06-08 | — | — | US | disclosed |
| US-20170146907-A1 | RESIN COMPOSITION FOR UNDERLAYER FILM FORMATION, LAYERED PRODUCT, METHOD FOR FORMING PATTERN, IMPRINT FORMING KIT AND PROCESS FOR PRODUCING DEVICE | FUJIFILM CORPORATION (JP) | 2017-05-25 | — | — | US | disclosed |
| US-20170088743-A1 | RESIN COMPOSITION FOR UNDERLAYER FILM FORMATION, LAYERED PRODUCT, METHOD FOR FORMING PATTERN, AND PROCESS FOR PRODUCING DEVICE | FUJIFILM CORPORATION (JP) | 2017-03-30 | — | — | US | disclosed |
| US-9296842-B2 | Polymer for lithography | MITSUBISHI RAYON CO., LTD. (JP) | 2016-03-29 | — | — | US | disclosed |
| US-8304572-B2 | Synthesis of fluoroalcohol-substituted (meth)acrylate esters and polymers derived therefrom | E I DU PONT DE NEMOURS AND COMPANY (US) | 2012-11-06 | — | — | US | disclosed |
| US-20120115086-A1 | METHOD FOR PRODUCING POLYMER, POLYMER FOR LITHOGRAPHY, RESIST COMPOSITION, AND METHOD FOR PRODUCING SUBSTRATE | MITSUBISHI RAYON CO., LTD. (JP) | 2012-05-10 | — | — | US | disclosed |
| US-8148053-B2 | DNA sequenceing, biochemical immobilization, and genetic diagnosis; forming monomolecular film using (alkoxyalkoxy)alkylsilane(triol and/or halide) such as 10-(methoxymethoxy)dodecyltrimethoxysilane which forms hydroxyl groups when exposed to acid; forming polysulfonates; radiation with high energy beams | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-04-03 | — | — | US | disclosed |
| US-8034534-B2 | Fluorinated polymers for use in immersion lithography | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2011-10-11 | — | — | US | disclosed |
| US-20110213175-A1 | SYNTHESIS OF FLUOROALCOHOL-SUBSTITUTED (METH)ACRYLATE ESTERS AND POLYMERS DERIVED THEREFROM | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2011-09-01 | — | — | US | disclosed |
| US-20090253074-A1 | FLUORINATED POLYMERS FOR USE IN IMMERSION LITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY | 2009-10-08 | — | — | US | disclosed |
| US-20080248418-A1 | SYNTHESIS OF FLUOROALCOHOL-SUBSTITUTED (METH)ACRYLATE ESTERS AND POLYMERS DERIVED THEREFROM | E. I. DU PONT DE NEMOURS AND COMPANY | 2008-10-09 | — | — | US | disclosed |
| US-20080233292-A1 | Method for manufacturing substrate for microarray | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-25 | — | — | US | disclosed |
| US-20080233309-A1 | Method for manufacturing substrate for making microarray | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-25 | — | — | US | disclosed |
| WO-2008021291-A2 | FLUORINATED POLYMERS FOR USE IN IMMERSION LITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-02-21 | — | — | WO | disclosed |