Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6522429 | 1.00 | CYP2C19 (0.31) | CYP2C19 | |
| SCHEMBL3291143 | 1.00 | CYP2C19 (0.31) | CYP2C19 | |
| SCHEMBL3288533 | 1.00 | CYP2C19 (0.31) | CYP2C19 | |
| SCHEMBL2680377 | 1.00 | CYP2C19 (0.31) | CYP2C19 | |
| SCHEMBL479236 | 1.00 | CYP2C19 (0.31) | CYP2C19 | |
| SCHEMBL3292924 | 1.00 | CYP2C19 (0.31) | CYP2C19 | |
| SCHEMBL2064948 | 0.98 | — | — | |
| SCHEMBL989309 | 0.98 | — | — | |
| SCHEMBL3288490 | 0.94 | — | — | |
| SCHEMBL3286642 | 0.90 | CD81 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9527938-B2 | Copolymer for lithography and method of manufacturing the same, resist composition, and method of manufacturing substrate | MITSUBISHI RAYON CO., LTD. (JP) | 2016-12-27 | — | — | US | claimed |
| US-20150099230-A1 | COPOLYMER FOR LITHOGRAPHY AND METHOD OF MANUFACTURING THE SAME, RESIST COMPOSITION, AND METHOD OF MANUFACTURING SUBSTRATE | MITSUBISHI RAYON CO., LTD. (JP) | 2015-04-09 | — | — | US | claimed |
| US-20110053083-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND PROCESS FOR ITS USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-03-03 | — | — | US | claimed |
| US-20210011379-A1 | POSITIVE-WORKING PHOTORESIST COMPOSITION, PATTERN PRODUCED THEREFROM, AND METHOD FOR PRODUCING PATTERN | LG CHEM, LTD. (KR) | 2021-01-14 | — | — | US | disclosed |
| EP-3186226-B1 | OXIME SULFONATE DERIVATIVES | BASF SE (DE) | 2020-06-17 | — | — | EP | disclosed |
| US-10336851-B2 | Copolymer for semiconductor lithography, resist composition, and method for manufacturing substrate | MITSUBISHI CHEMICAL CORPORATION | 2019-07-02 | — | — | US | disclosed |
| US-20190171099-A1 | POLYMERIZABLE COMPOSITION COMPRISING AN OXIME SULFONATE AS THERMAL CURING AGENT | BASF SE (DE) | 2019-06-06 | — | — | US | disclosed |
| US-10241399-B2 | Polymerizable composition comprising an oxime sulfonate as thermal curing agent | BASF SE (DE) | 2019-03-26 | — | — | US | disclosed |
| US-10234761-B2 | Oxime ester photoinitiators | BASF SE (DE) | 2019-03-19 | — | — | US | disclosed |
| EP-2668156-B1 | POLYMERIZABLE COMPOSITION COMPRISING AN OXIME SULFONATE AS THERMAL CURING AGENT | BASF SE (DE) | 2018-10-31 | — | — | EP | disclosed |
| US-10073343-B2 | Non-ionic compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-09-11 | — | — | US | disclosed |
| US-20150147695-A1 | RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-05-28 | — | — | US | disclosed |
| US-20130331533-A1 | POLYMER FOR LITHOGRAPHY | MITSUBISHI RAYON CO., LTD. (JP) | 2013-12-12 | — | — | US | disclosed |
| EP-2668156-A1 | POLYMERIZABLE COMPOSITION COMPRISING AN OXIME SULFONATE AS THERMAL CURING AGENT | BASF SE (DE) | 2013-12-04 | — | — | EP | disclosed |
| US-20130308219-A1 | POLYMERIZABLE COMPOSITION COMPRISING AN OXIME SULFONATE AS THERMAL CURING AGENT | BASF SE (DE) | 2013-11-21 | — | — | US | disclosed |
| US-20130224654-A1 | COPOLYMERS FOR LITHOGRAPHY AND METHOD FOR PRODUCING SAME, RESIST COMPOSITION, METHOD FOR PRODUCING SUBSTRATE WITH PATTERN FORMED THEREUPON, METHOD FOR EVALUATING COPOLYMERS, AND METHOD FOR ANALYZING COPOLYMER COMPOSITIONS | MITSUBISHI RAYON CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| WO-2012101245-A1 | POLYMERIZABLE COMPOSITION COMPRISING AN OXIME SULFONATE AS THERMAL CURING AGENT | BASF SE (DE) | 2012-08-02 | — | — | WO | disclosed |
| US-20120115086-A1 | METHOD FOR PRODUCING POLYMER, POLYMER FOR LITHOGRAPHY, RESIST COMPOSITION, AND METHOD FOR PRODUCING SUBSTRATE | MITSUBISHI RAYON CO., LTD. (JP) | 2012-05-10 | — | — | US | disclosed |
| US-20110053083-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND PROCESS FOR ITS USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-03-03 | — | — | US | disclosed |
| US-7713680-B2 | Radiation sensitive resin composition for forming a protective film, method of forming a protective film from the composition, liquid crystal display device and solid-state image sensing device | JSR CORPORATION (JP) | 2010-05-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10234761-B2 | Oxime ester photoinitiators | C9, C5, CBR3 | CYP2C19 13/4885 |
| US-10073343-B2 | Non-ionic compound, resin, resist composition and method for producing resist pattern | AFF1, AFF2, RER1 | CYP2C19 2793/4885 |
| US-10241399-B2 | Polymerizable composition comprising an oxime sulfonate as thermal curing agent | SULT1E1, COX6B1, SULT1A1 | CYP2C19 189/4885 |
| US-20190171099-A1 | POLYMERIZABLE COMPOSITION COMPRISING AN OXIME SULFONATE AS THERMAL CURING AGENT | SULT1E1, COX6B1, SULT1A1 | CYP2C19 189/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.