SCHEMBL6522429

SCHEMBL6522429

CCC1(C=C(C)C(=O)O)CCCCCCCCCCC1

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3291143 1.00 CYP2C19 (0.31) CYP2C19
SCHEMBL2680077 1.00 CYP2C19 (0.31) CYP2C19
SCHEMBL3288533 1.00 CYP2C19 (0.31) CYP2C19
SCHEMBL2680377 1.00 CYP2C19 (0.31) CYP2C19
SCHEMBL479236 1.00 CYP2C19 (0.31) CYP2C19
SCHEMBL3292924 1.00 CYP2C19 (0.31) CYP2C19
SCHEMBL2064948 0.98
SCHEMBL989309 0.98
SCHEMBL3288490 0.94
SCHEMBL3286642 0.90 CD81 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110053083-A1 CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND PROCESS FOR ITS USE INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-03-03 US claimed
US-20210011379-A1 POSITIVE-WORKING PHOTORESIST COMPOSITION, PATTERN PRODUCED THEREFROM, AND METHOD FOR PRODUCING PATTERN LG CHEM, LTD. (KR) 2021-01-14 US disclosed
US-20110053083-A1 CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND PROCESS FOR ITS USE INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-03-03 US disclosed