Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6522429 | 1.00 | CYP2C19 (0.31) | CYP2C19 | |
| SCHEMBL3291143 | 1.00 | CYP2C19 (0.31) | CYP2C19 | |
| SCHEMBL2680077 | 1.00 | CYP2C19 (0.31) | CYP2C19 | |
| SCHEMBL3288533 | 1.00 | CYP2C19 (0.31) | CYP2C19 | |
| SCHEMBL2680377 | 1.00 | CYP2C19 (0.31) | CYP2C19 | |
| SCHEMBL3292924 | 1.00 | CYP2C19 (0.31) | CYP2C19 | |
| SCHEMBL2064948 | 0.98 | — | — | |
| SCHEMBL989309 | 0.98 | — | — | |
| SCHEMBL3288490 | 0.94 | — | — | |
| SCHEMBL3286642 | 0.90 | CD81 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 131 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118625599-A | Photosensitive resin composition, photosensitive dry film and preparation method thereof | 杭州福斯特电子材料有限公司 | 2024-09-10 | — | — | CN | claimed |
| US-9527938-B2 | Copolymer for lithography and method of manufacturing the same, resist composition, and method of manufacturing substrate | MITSUBISHI RAYON CO., LTD. (JP) | 2016-12-27 | — | — | US | claimed |
| US-20150099230-A1 | COPOLYMER FOR LITHOGRAPHY AND METHOD OF MANUFACTURING THE SAME, RESIST COMPOSITION, AND METHOD OF MANUFACTURING SUBSTRATE | MITSUBISHI RAYON CO., LTD. (JP) | 2015-04-09 | — | — | US | claimed |
| US-20110053083-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND PROCESS FOR ITS USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-03-03 | — | — | US | claimed |
| US-11760871-B2 | Thermosetting resin composition, prepreg, resin sheet, metal foil-clad laminate, and printed wiring board | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-09-19 | — | — | US | disclosed |
| CN-110133965-B | Chemically amplified positive resist composition | 台湾永光化学工业股份有限公司 | 2023-04-07 | — | — | CN | disclosed |
| US-20210395514-A1 | THERMOSETTING RESIN COMPOSITION, PREPREG, RESIN SHEET, METAL FOIL-CLAD LAMINATE, AND PRINTED WIRING BOARD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-12-23 | — | — | US | disclosed |
| US-20210011379-A1 | POSITIVE-WORKING PHOTORESIST COMPOSITION, PATTERN PRODUCED THEREFROM, AND METHOD FOR PRODUCING PATTERN | LG CHEM, LTD. (KR) | 2021-01-14 | — | — | US | disclosed |
| EP-3186226-B1 | OXIME SULFONATE DERIVATIVES | BASF SE (DE) | 2020-06-17 | — | — | EP | disclosed |
| CN-111095105-A | Actinic-ray-or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | 富士胶片株式会社 | 2020-05-01 | — | — | CN | disclosed |
| US-10336851-B2 | Copolymer for semiconductor lithography, resist composition, and method for manufacturing substrate | MITSUBISHI CHEMICAL CORPORATION | 2019-07-02 | — | — | US | disclosed |
| US-20190171099-A1 | POLYMERIZABLE COMPOSITION COMPRISING AN OXIME SULFONATE AS THERMAL CURING AGENT | BASF SE (DE) | 2019-06-06 | — | — | US | disclosed |
| US-20090226850-A1 | PROCESS FOR PRODUCING RESIST PATTERN AND CONDUCTOR PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-09-10 | — | — | US | disclosed |
| EP-2082872-A1 | SURFACE-TREATED RESIN, METHOD FOR PRODUCING THE SAME, AND USE OF THE SAME | OMRON Corporation, a corporation of Japan (JP) | 2009-07-29 | — | — | EP | disclosed |
| US-7521169-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| EP-1817634-B1 | PROCESS FOR PRODUCING RESIST PATTERN AND CONDUCTOR PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2009-04-08 | — | — | EP | disclosed |
| WO-2009038635-A1 | PROCESS FOR PREPARING COMPOSITIONALLY UNIFORM COPOLYMERS | DUPONT ELECTRONIC POLYMERS L.P. (US) | 2009-03-26 | — | — | WO | disclosed |
| US-20090076230-A1 | Process for preparing compositionally uniform copolymers | DUPONT ELECTRONIC POLYMERS L.P. | 2009-03-19 | — | — | US | disclosed |
| US-20070054214-A1 | Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions | JSR CORPORATION (JP) | 2007-03-08 | — | — | US | disclosed |
| US-20060234153-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20190171099-A1 | POLYMERIZABLE COMPOSITION COMPRISING AN OXIME SULFONATE AS THERMAL CURING AGENT | SULT1E1, COX6B1, SULT1A1 | CYP2C19 189/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.