⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2064948 | 1.00 | — | — | |
| SCHEMBL2680077 | 0.98 | CYP2C19 (0.31) | — | |
| SCHEMBL3292924 | 0.98 | CYP2C19 (0.31) | — | |
| SCHEMBL3288533 | 0.98 | CYP2C19 (0.31) | — | |
| SCHEMBL479236 | 0.98 | CYP2C19 (0.31) | — | |
| SCHEMBL3291143 | 0.98 | CYP2C19 (0.31) | — | |
| SCHEMBL6522429 | 0.98 | CYP2C19 (0.31) | — | |
| SCHEMBL2680377 | 0.98 | CYP2C19 (0.31) | — | |
| SCHEMBL3288490 | 0.96 | — | — | |
| SCHEMBL3286642 | 0.92 | CD81 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 190 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9527938-B2 | Copolymer for lithography and method of manufacturing the same, resist composition, and method of manufacturing substrate | MITSUBISHI RAYON CO., LTD. (JP) | 2016-12-27 | — | — | US | claimed |
| US-20150099230-A1 | COPOLYMER FOR LITHOGRAPHY AND METHOD OF MANUFACTURING THE SAME, RESIST COMPOSITION, AND METHOD OF MANUFACTURING SUBSTRATE | MITSUBISHI RAYON CO., LTD. (JP) | 2015-04-09 | — | — | US | claimed |
| US-8557501-B2 | Developable bottom antireflective coating compositions especially suitable for ion implant applications | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-10-15 | — | — | US | claimed |
| US-20120178029-A1 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-07-12 | — | — | US | claimed |
| EP-2287671-B1 | Process for forming a coated substrate | COMMW SCIENT IND RES ORG (AU) | 2012-06-06 | — | — | EP | claimed |
| US-8182978-B2 | Developable bottom antireflective coating compositions especially suitable for ion implant applications | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-05-22 | — | — | US | claimed |
| EP-1664927-B1 | LOW-POLYDISPERSITY PHOTOIMAGEABLE ACRYLIC POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | COMMW SCIENT IND RES ORG (AU) | 2011-04-06 | — | — | EP | claimed |
| US-20110053083-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND PROCESS FOR ITS USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-03-03 | — | — | US | claimed |
| EP-2287671-A1 | Process for forming a coated substrate | Commonwealth Scientific and Industrial Research Organisation (AU) | 2011-02-23 | — | — | EP | claimed |
| US-7696292-B2 | Controlled radical polymerization; photoresists with high transparency at 157-248 nm and good resolution | COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATION (AU) | 2010-04-13 | — | — | US | claimed |
| US-20090253074-A1 | FLUORINATED POLYMERS FOR USE IN IMMERSION LITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY | 2009-10-08 | — | — | US | claimed |
| WO-2008021291-A2 | FLUORINATED POLYMERS FOR USE IN IMMERSION LITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-02-21 | — | — | WO | claimed |
| EP-1664927-A1 | LOW-POLYDISPERSITY PHOTOIMAGEABLE ACRYLIC POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2006-06-07 | — | — | EP | claimed |
| US-20050119378-A1 | Controlled radical polymerization; photoresists with high transparency at 157-248 nm and good resolution | DUPONT ELECTRONICS, INC. | 2005-06-02 | — | — | US | claimed |
| WO-2005031461-A1 | LOW-POLYDISPERSITY PHOTOIMAGEABLE ACRYLIC POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2005-04-07 | — | — | WO | claimed |
| EP-4372030-A1 | CURABLE RESIN COMPOSITION | Namics Corporation (JP) | 2024-05-22 | — | — | EP | disclosed |
| EP-4372021-A1 | CURABLE RESIN COMPOSITION | Namics Corporation (JP) | 2024-05-22 | — | — | EP | disclosed |
| US-20050170276-A1 | Chemical-amplification positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-08-04 | — | — | US | disclosed |
| US-20050119378-A1 | Controlled radical polymerization; photoresists with high transparency at 157-248 nm and good resolution | DUPONT ELECTRONICS, INC. | 2005-06-02 | — | — | US | disclosed |
| WO-2005031461-A1 | LOW-POLYDISPERSITY PHOTOIMAGEABLE ACRYLIC POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2005-04-07 | — | — | WO | disclosed |