SCHEMBL2065787

SCHEMBL2065787

COc1ccc(S(=O)(=O)Oc2ccc(OS(=O)(=O)c3ccc(OC)cc3)c(S([O])(=O)=O)c2)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.59
LMNA P02545 1/20 0.59
HTT P42858 1/20 0.59
SMN1; SMN2 Q16637 1/20 0.59
TDP1 Q9NUW8 1/20 0.59
MAOB P27338 1/20 0.49
TUBB4A P04350 1/20 0.48
TUBB P07437 1/20 0.48
TUBA3C P0DPH7 1/20 0.48
TUBA1B P68363 1/20 0.48
TUBA4A P68366 1/20 0.48
TUBB4B P68371 1/20 0.48
TUBB3 Q13509 1/20 0.48
TUBB2A Q13885 1/20 0.48
TUBB8 Q3ZCM7 1/20 0.48
TUBA3E Q6PEY2 1/20 0.48
TUBA1A Q71U36 1/20 0.48
TUBA1C Q9BQE3 1/20 0.48
TUBB6 Q9BUF5 1/20 0.48
TUBB2B Q9BVA1 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2064981 0.88 KMT2A (0.54) L3MBTL1LMNAHTTSMN1; SMN2TDP1
SCHEMBL6307152 0.86 LMNA (0.57) L3MBTL1LMNAHTTSMN1; SMN2TDP1
SCHEMBL2065215 0.80 TDP1 (0.60) L3MBTL1LMNAHTTSMN1; SMN2TDP1
SCHEMBL8818892 0.79 TDP1 (0.68) L3MBTL1LMNAHTTSMN1; SMN2TDP1
SCHEMBL9308804 0.78 TDP1 (0.73) L3MBTL1LMNAHTTSMN1; SMN2TDP1
SCHEMBL13924692 0.75 KMT2A (0.54) L3MBTL1LMNAHTTSMN1; SMN2TDP1
SCHEMBL6344050 0.74 LMNA (0.58) L3MBTL1LMNAHTTSMN1; SMN2TDP1
SCHEMBL11844234 0.74 TDP1 (0.62) L3MBTL1LMNAHTTSMN1; SMN2TDP1
SCHEMBL342714 0.74 KMT2A (0.56) L3MBTL1LMNAHTTGAAKMT2A
SCHEMBL4076262 0.74 KMT2A (0.52) L3MBTL1LMNAHTTSMN1; SMN2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8148053-B2 DNA sequenceing, biochemical immobilization, and genetic diagnosis; forming monomolecular film using (alkoxyalkoxy)alkylsilane(triol and/or halide) such as 10-(methoxymethoxy)dodecyltrimethoxysilane which forms hydroxyl groups when exposed to acid; forming polysulfonates; radiation with high energy beams SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-04-03 US disclosed
US-7494760-B2 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-24 US disclosed
US-20080233309-A1 Method for manufacturing substrate for making microarray SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-09-25 US disclosed
US-20070287096-A1 Photoacid generators, chemically amplified resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2007-12-13 US disclosed