SCHEMBL20684752

SCHEMBL20684752

CC(C)(C1CCC(c2ccccc2)(c2ccccc2)CC1)C1CCC(c2ccc(O)cc2)(c2ccc(O)cc2)CC1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR2 Q92731 6/20 0.47
ESR1 P03372 5/20 0.47
OPRM1 P35372 3/20 0.44
GRIN2D O15399 1/20 0.44
GRIN3B O60391 1/20 0.44
CHRM2 P08172 1/20 0.44
CHRM1 P11229 1/20 0.44
GRIN1 Q05586 1/20 0.44
KCNH2 Q12809 1/20 0.44
GRIN2A Q12879 1/20 0.44
GRIN2B Q13224 1/20 0.44
GRIN2C Q14957 1/20 0.44
GRIN3A Q8TCU5 1/20 0.44
MAPT P10636 1/20 0.38
ALDH1A1 P00352 2/20 0.38
CYP3A4 P08684 1/20 0.38
MEN1 O00255 1/20 0.37
CYP2C9 P11712 1/20 0.37
KMT2A Q03164 1/20 0.37
CYP2D6 P10635 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL45831 0.93 ESR2 (0.53) ESR2ESR1OPRM1GRIN2DGRIN3B
SCHEMBL2605552 0.92 ESR2 (0.52) ESR2ESR1OPRM1GRIN2DGRIN3B
SCHEMBL11141715 0.90 ESR2 (0.44) ESR2ESR1OPRM1GRIN2DGRIN3B
SCHEMBL21335140 0.89 LTA4H (0.49) ESR2ESR1OPRM1GRIN2DGRIN3B
SCHEMBL9065276 0.87 ESR2 (0.55) ESR2ESR1OPRM1MAPTALDH1A1
SCHEMBL2605553 0.84 ESR2 (0.49) ESR2ESR1OPRM1CYP3A4CYP2C9
SCHEMBL9065614 0.84 ESR2 (0.44) ESR2ESR1OPRM1GRIN2DGRIN3B
SCHEMBL12893332 0.84 ESR2 (0.47) ESR2ESR1OPRM1GRIN2DGRIN3B
SCHEMBL1256648 0.84 ESR2 (0.47) ESR2ESR1OPRM1GRIN2DGRIN3B
SCHEMBL23250802 0.83 ESR2 (0.46) ESR2ESR1OPRM1GRIN2BALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3190107-B1 ARYL COMPOUND SUBSTITUTED WITH GLYCIDYL AND ALLYL GROUPS AS MACROMONOMER FOR HEAT RESISTANT RESIN MATERIALS SHINETSU CHEMICAL CO (JP) 2019-01-30 EP disclosed