SCHEMBL20691876

SCHEMBL20691876

CCC(I)C(=O)OCC1CC2CC1C(O)(F)C2(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18897904 0.85 — —
SCHEMBL20215430 0.83 — —
SCHEMBL18897963 0.71 — —
SCHEMBL20691777 0.71 — —
SCHEMBL20820983 0.67 — —
SCHEMBL22432364 0.66 — —
SCHEMBL18768277 0.65 NLRP3 (0.30) —
SCHEMBL21281784 0.63 — —
SCHEMBL18845366 0.63 ALDH1A1 (0.33) —
SCHEMBL23963260 0.63 TSHR (0.35) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20190033716-A1 SULFONIUM SALT, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-01-31 — — US disclosed
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