SCHEMBL2079050

SCHEMBL2079050

Cc1ccc([SiH](Cl)Cl)c(C)c1

nearest known ligand 0.42

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 5/20 0.42
TP53 P04637 2/20 0.42
CYP1A2 P05177 4/20 0.38
CYP2A6 P11509 4/20 0.38
ALDH1A1 P00352 2/20 0.37
CYP3A4 P08684 2/20 0.36
ADRA2A P08913 1/20 0.36
NPC1 O15118 1/20 0.36
RAB9A P51151 1/20 0.36
RAPGEF4 Q8WZA2 3/20 0.35
SMN1; SMN2 Q16637 2/20 0.33
ACHE P22303 2/20 0.33
THRB P10828 1/20 0.33
ALOX15 P16050 1/20 0.33
HTT P42858 1/20 0.33
TRPA1 O75762 1/20 0.33
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11528198 0.78 SMN1; SMN2 (0.37) TDP1TP53CYP1A2CYP2A6ALDH1A1
SCHEMBL8967438 0.75 TDP1 (0.42) TDP1TP53CYP1A2CYP2A6ALDH1A1
SCHEMBL8967365 0.75 TDP1 (0.42) TDP1TP53CYP1A2CYP2A6ALDH1A1
SCHEMBL3296351 0.73 TDP1 (0.41) TDP1TP53CYP1A2CYP2A6ALDH1A1
SCHEMBL1315310 0.72 LMNA (0.37) TDP1CYP1A2ALDH1A1CYP3A4NPC1
SCHEMBL10769654 0.70 TDP1 (0.38) TDP1TP53CYP1A2CYP2A6ALDH1A1
SCHEMBL12814923 0.69 LMNA (0.35) TDP1TP53CYP1A2CYP2A6CYP3A4
SCHEMBL3482374 0.69 MAPT (0.40) CYP1A2CYP2A6ALDH1A1SMN1; SMN2
SCHEMBL7035819 0.67 TP53 (0.41) TDP1TP53CYP1A2CYP2A6ALDH1A1
Chloromethane SCHEMBL27361156 0.67 TDP1 (0.50) TDP1TP53CYP1A2CYP2A6ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8163460-B2 Underlayer coating forming composition for lithography containing polysilane compound NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-04-24 US disclosed
US-8163863-B2 Polysilane and polysilane-containing resin composition OSAKA GAS CO., LTD. (JP) 2012-04-24 US disclosed
US-20090156775-A1 POLYSILANE AND POLYSILANE-CONTAINING RESIN COMPOSITION OSAKA GAS CO., LTD. (JP) 2009-06-18 US disclosed
US-20080318158-A1 Underlayer Coating Forming Composition for Lithography Containing Polysilane Compound NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-12-25 US disclosed
EP-1958979-A1 POLYSILANE AND RESIN COMPOSITION CONTAINING POLYSILANE OSAKA GAS CO., LTD. (JP) 2008-08-20 EP disclosed
EP-0514034-B1 Silane products from reaction of solid silicon monoxide with aromatic halides DOW CORNING (US) 1996-02-28 EP disclosed
EP-0514034-A1 Silane products from reaction of solid silicon monoxide with aromatic halides DOW CORNING CORPORATION (US) 1992-11-19 EP disclosed
US-5120520-A In presence of metal or metal-contianing catalyst DOW CORNING CORPORATION (US) 1992-06-09 US disclosed