SCHEMBL2087097

SCHEMBL2087097

O=C1OC(=O)c2c1cccc2-c1cccc2c1C(=O)OC2=O

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.60
ALOX15 P16050 2/20 0.60
TYMS P04818 4/20 0.54
ALDH1A1 P00352 8/20 0.38
TSHR P16473 4/20 0.38
MAOA P21397 3/20 0.37
MEN1 O00255 3/20 0.36
KMT2A Q03164 3/20 0.36
CDC25B P30305 1/20 0.36
HPGD P15428 3/20 0.36
LMNA P02545 3/20 0.36
MAPT P10636 3/20 0.36
MAPK1 P28482 3/20 0.36
HTT P42858 2/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
MAOB P27338 1/20 0.36
HSD17B10 Q99714 1/20 0.36
KDM4E B2RXH2 3/20 0.35
L3MBTL1 Q9Y468 2/20 0.35
CES2 O00748 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31548711 1.00 TDP1 (0.60) TDP1ALOX15TYMSALDH1A1TSHR
SCHEMBL31416073 0.87 TDP1 (0.52) TDP1ALOX15TYMSALDH1A1TSHR
SCHEMBL308375 0.87 TDP1 (0.52) TDP1ALOX15TYMSALDH1A1TSHR
SCHEMBL542116 0.84 TDP1 (0.54) TDP1ALOX15TYMSALDH1A1HPGD
SCHEMBL30482669 0.83 TYMS (0.50) TDP1ALOX15TYMSALDH1A1MAOA
SCHEMBL10757241 0.83 TDP1 (0.48) TDP1ALOX15TYMSALDH1A1MEN1
SCHEMBL166198 0.82 ALOX15 (0.52) TDP1ALOX15TYMSALDH1A1TSHR
SCHEMBL10502400 0.82 TDP1 (0.52) TDP1ALOX15TYMSALDH1A1TSHR
SCHEMBL29539686 0.82 ALOX15 (0.52) TDP1ALOX15TYMSALDH1A1TSHR
SCHEMBL19604974 0.82 TDP1 (0.52) TDP1ALOX15TYMSALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 179 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2679623-B1 Curing agent for epoxy resin systems and their use EVONIK DEGUSSA GMBH (DE) 2017-01-11 EP claimed
US-9349584-B2 Method for depositing a film and film deposition apparatus TOKYO ELECTRON LIMITED (JP) 2016-05-24 US claimed
US-20150087158-A1 METHOD FOR DEPOSITING A FILM AND FILM DEPOSITION APPARATUS TOKYO ELECTRON LIMITED (JP) 2015-03-26 US claimed
US-20140005344-A1 HARDENER FOR EPOXY RESIN SYSTEMS AND USE THEREOF EVONIK INDUSTRIES AG (DE) 2014-01-02 US claimed
WO-2023228986-A1 LAMINATE 三菱瓦斯化学株式会社 2023-11-30 WO disclosed
US-11806661-B2 Polymer and method for producing the same, gas separation membrane, gas separation module, and gas separation apparatus using the polymer, and m-phenylenediamine compound FUJIFILM CORPORATION (JP) 2023-11-07 US disclosed
US-20230119573-A1 GAS SEPARATION MEMBRANE, GAS SEPARATION MODULE, GAS SEPARATION APPARATUS, AND POLYIMIDE COMPOUND FUJIFILM CORPORATION (JP) 2023-04-20 US disclosed
EP-3453733-B1 POLYIMIDE RESIN, POLYIMIDE RESIN COMPOSITION, AND POLYIMIDE FILM MITSUBISHI GAS CHEMICAL CO (JP) 2023-01-18 EP disclosed
US-11332578-B2 Polyimide resin, polyimide resin composition, and polyimide film MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-05-17 US disclosed
US-20210395568-A1 POLYIMIDE RESIN, VARNISH, AND POLYIMIDE FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-12-23 US disclosed
EP-3882299-A1 POLYIMIDE RESIN, VARNISH, AND POLYIMIDE FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-09-22 EP disclosed
WO-2021153379-A1 POLYIMIDE RESIN, POLYIMIDE VARNISH, AND POLYIMIDE FILM 三菱瓦斯化学株式会社 2021-08-05 WO disclosed
US-20080003381-A1 Overcoat film composition, color filter substrate, and liquid crystal display element CHISSO CORPORATION 2008-01-03 US disclosed
US-20080003381-A1 Overcoat film composition, color filter substrate, and liquid crystal display element CHISSO CORPORATION 2008-01-03 US disclosed
US-20070232780-A1 PHOTO-ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY ELEMENT CHISSO CORPORATION (JP) 2007-10-04 US disclosed
US-20070232780-A1 PHOTO-ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY ELEMENT CHISSO CORPORATION (JP) 2007-10-04 US disclosed
US-20070213502-A1 Composition for forming insulating layer and insulating film JNC CORPORATION (JP) 2007-09-13 US disclosed
US-20070213502-A1 Composition for forming insulating layer and insulating film JNC CORPORATION (JP) 2007-09-13 US disclosed
US-20070106057-A1 Polyimide resin, method of producing polyimide resin, and electrolyte membrane, catalyst layer, membrane/electrode assembly and device each containing polyimide resin YAMANASHI, UNIVERSITY OF (JP) 2007-05-10 US disclosed
US-20070106057-A1 Polyimide resin, method of producing polyimide resin, and electrolyte membrane, catalyst layer, membrane/electrode assembly and device each containing polyimide resin YAMANASHI, UNIVERSITY OF (JP) 2007-05-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11806661-B2 Polymer and method for producing the same, gas separation membrane, gas separation module, and gas separation apparatus using the polymer, and m-phenylenediamine compound PRMT9, PRMT1, PNMT TDP1 2677/4885ALOX15 4463/4885TYMS 4416/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.