SCHEMBL2088979

SCHEMBL2088979

COCc1ccccc1Oc1ccccc1

nearest known ligand 0.59

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
SLC6A4 P31645 7/20 0.59
SLC6A2 P23975 4/20 0.59
RIPK1 Q13546 1/20 0.59
HRH1 P35367 1/20 0.56
SLC6A3 Q01959 3/20 0.50
FFAR1 O14842 1/20 0.48
ALDH1A1 P00352 1/20 0.47
MAPK1 P28482 1/20 0.47
HTT P42858 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
HTR2A P28223 4/20 0.46
IDO1 P14902 2/20 0.46
CYP19A1 P11511 1/20 0.45
FAAH O00519 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6931451 0.87 IDO1 (0.52) SLC6A4SLC6A2RIPK1HRH1SLC6A3
SCHEMBL7255833 0.87 SLC6A4 (0.50) SLC6A4SLC6A2RIPK1HRH1SLC6A3
SCHEMBL3787055 0.85 SLC6A4 (0.53) SLC6A4SLC6A2RIPK1HRH1SLC6A3
SCHEMBL2031145 0.83 HRH1 (0.60) SLC6A4SLC6A2RIPK1HRH1SLC6A3
SCHEMBL29669692 0.83 HRH1 (0.60) SLC6A4SLC6A2RIPK1HRH1SLC6A3
SCHEMBL17525882 0.83 SLC6A4 (0.66) SLC6A4SLC6A2RIPK1HRH1SLC6A3
SCHEMBL28044355 0.82 FFAR1 (0.65) SLC6A4SLC6A2RIPK1HRH1SLC6A3
SCHEMBL2088976 0.80 HRH1 (0.56) SLC6A4SLC6A2RIPK1HRH1SLC6A3
SCHEMBL10942713 0.80 HRH1 (0.56) SLC6A4SLC6A2RIPK1HRH1SLC6A3
SCHEMBL17523377 0.79 RIPK1 (0.64) SLC6A4SLC6A2RIPK1HRH1SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1001312-B1 Radiation sensitive recording material for the production of dry offset printing plates AGFA GEVAERT (BE) 2002-07-31 EP claimed
US-6274285-B1 Radiation-sensitive recording material for the production of driographic offset printing plates AGFA-GEVAERT NV (BE) 2001-08-14 US claimed
EP-1001312-A1 Radiation sensitive recording material for the production of dry offset printing plates Agfa-Gevaert AG (DE) 2000-05-17 EP claimed
US-20230337672-A1 METHOD OF CONTROLLING SOYBEAN RUST FUNGUS HAVING RESISTANCE TO QoI FUNGICIDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-10-26 US disclosed
US-20230337672-A1 METHOD OF CONTROLLING SOYBEAN RUST FUNGUS HAVING RESISTANCE TO QoI FUNGICIDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-10-26 US disclosed
US-20230232827-A1 METHOD FOR CONTROLLING SOYBEAN RUST FUNGUS RESISTANT TO QoI FUNGICIDES SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-07-27 US disclosed
US-20230232827-A1 METHOD FOR CONTROLLING SOYBEAN RUST FUNGUS RESISTANT TO QoI FUNGICIDES SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-07-27 US disclosed
EP-2970172-B1 BICYCLO [2.2.2]ACID GPR120 MODULATORS BRISTOL MYERS SQUIBB CO (US) 2019-10-30 EP disclosed
EP-3367999-A1 FRAGRANCE COMPOSITIONS COMPRISING IONIC LIQUIDS The Procter and Gamble Company (US) 2018-09-05 EP disclosed
WO-2017075299-A1 FRAGRANCE COMPOSITIONS COMPRISING IONIC LIQUIDS THE PROCTER & GAMBLE COMPANY (US) 2017-05-04 WO disclosed
US-9598390-B2 Bicyclo[2.2.2]acid GPR120 modulators BRISTOL-MYERS SQUIBB COMPANY (US) 2017-03-21 US disclosed
EP-0619519-A1 Photosensitive polycondensation compound for negative lithographic plates LASTRA S.P.A. (IT) 1994-10-12 EP disclosed
US-5298364-A Negative photoresists, acid crosslinking HOECHST AKTIENGESELLSCHAFT (DE) 1994-03-29 US disclosed
EP-0573609-A1 PHOTOSENSITIVE COMPOSITIONS CONTAINING COMB POLYMER BINDERS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1993-12-15 EP disclosed
WO-1992015628-A1 PHOTOSENSITIVE COMPOSITIONS CONTAINING COMB POLYMER BINDERS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1992-09-17 WO disclosed
EP-0180122-B1 DEVELOPER FOR EXPOSED NEGATIVELY OPERATING REGISTRATION LAYERS, PROCESS FOR PRODUCING PRINTING PLATES AND USE OF THE DEVELOPER HOECHST AKTIENGESELLSCHAFT (DE) 1991-10-23 EP disclosed
EP-0180122-A2 Developer for exposed negatively operating registration layers, process for producing printing plates and use of the developer HOECHST AKTIENGESELLSCHAFT (DE) 1986-05-07 EP disclosed
US-4533718-A INSULATION COATINGS FOR HIGH PERFORMANCE MOTORS WESTINGHOUSE ELECTRIC CORP. (US) 1985-08-06 US disclosed
EP-0004569-B1 PROCESS FOR THE ANODIC OXYDATION OF ALUMINIUM AND ITS USE AS PRINTING PLATE CARRIER MATERIAL HOECHST AKTIENGESELLSCHAFT (DE) 1982-11-03 EP disclosed
US-3960982-A NOVOLAKS HITACHI, LTD. (JA) 1976-06-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230337672-A1 METHOD OF CONTROLLING SOYBEAN RUST FUNGUS HAVING RESISTANCE TO QoI FUNGICIDE CYC1, SQOR, MT-CO1 SLC6A4 2945/4885SLC6A2 3147/4885RIPK1 1955/4885
US-20230232827-A1 METHOD FOR CONTROLLING SOYBEAN RUST FUNGUS RESISTANT TO QoI FUNGICIDES CYC1, SQOR, MT-CO3 SLC6A4 2901/4885SLC6A2 2871/4885RIPK1 2765/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.