SCHEMBL208911

SCHEMBL208911

C=C(C)C(=O)OCCOC(=O)C1CCCCC1C(=O)OCCOC(=O)C(=C)C

nearest known ligand 0.53

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.52
TSHR P16473 3/20 0.46
ALDH1A1 P00352 2/20 0.44
TP53 P04637 1/20 0.44
CYP3A4 P08684 1/20 0.44
EPHX1 P07099 2/20 0.38
CA1 P00915 3/20 0.36
CA2 P00918 3/20 0.36
POLB P06746 1/20 0.36
APEX1 P27695 1/20 0.36
HTT P42858 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
FKBP1A P62942 3/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL73761 0.93 THRB (0.46) THRBTSHRALDH1A1TP53CYP3A4
SCHEMBL16466610 0.93 THRB (0.46) THRBTSHRALDH1A1TP53CYP3A4
SCHEMBL14473517 0.93 THRB (0.46) THRBTSHRALDH1A1TP53CYP3A4
SCHEMBL513380 0.93 THRB (0.46) THRBTSHRALDH1A1TP53CYP3A4
SCHEMBL422110 0.93 TSHR (0.56) THRBTSHRALDH1A1TP53CYP3A4
SCHEMBL422679 0.93 TSHR (0.51) THRBTSHRALDH1A1TP53CYP3A4
SCHEMBL18351239 0.92 THRB (0.45) THRBTSHRALDH1A1TP53CYP3A4
SCHEMBL75023 0.90 THRB (0.46) THRBTSHRALDH1A1TP53CYP3A4
SCHEMBL14944772 0.89 THRB (0.55) THRBTSHRALDH1A1TP53CYP3A4
SCHEMBL16466670 0.87 TSHR (0.46) THRBTSHRALDH1A1TP53CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1628 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119709029-A High-temperature-resistant solvent-resistant adhesive, PC anti-counterfeiting film and preparation method thereof 武汉华工图像技术开发有限公司 2025-03-28 CN claimed
CN-118813172-A Moisture-proof and boiling-resistant adhesive, multilayer-structured decorative film and preparation method thereof 上海华工艾马尔新材料有限公司 2024-10-22 CN claimed
CN-117363183-A UV adhesive composition, preparation process and polarizing plate thereof 福州恒美光电材料有限公司 2024-01-09 CN claimed
US-10866661-B2 Film touch sensor and method for fabricating the same DONGWOO FINE-CHEM CO., LTD. (KR) 2020-12-15 US claimed
EP-3642288-A1 POLYMERISABLE COMPOSITION COMPRISING TEMPO COMPOUND Lucite International UK Limited (GB) 2020-04-29 EP claimed
CN-110951008-A Solid sheet-shaped polycarboxylic slump retaining agent prepared by soap-free emulsion polymerization method and method 湖北工业大学 2020-04-03 CN claimed
CN-110724416-A Preparation method of modified hydroxyl ester-based polymer emulsion 湖北工业大学 2020-01-24 CN claimed
CN-110698587-A Preparation method of high-performance super-concentrated emulsion polymer 湖北工业大学 2020-01-17 CN claimed
CN-110684145-A Preparation method of super-concentrated carboxyl ester emulsion polymer 湖北工业大学 2020-01-14 CN claimed
CN-110684148-A Preparation method of cationic ester-based soap-free emulsion polymer 湖北工业大学 2020-01-14 CN claimed
US-20100276186-A1 PHOTOSENSITIVE INSULATING RESIN COMPOSITION, HARDENING PRODUCT THEREOF, AND CIRCUIT BOARD EQUIPPED THEREWITH JSR CORPORATION (JP) 2010-11-04 US claimed
US-20090252885-A1 Photopolymer Resins for Photo Replication of Information Layers ADDISON CLEAR WAVE, LLC (US) 2009-10-08 US claimed
US-20090078747-A1 Anisotropic conductive adhesive composition, anisotropic conductive film comprising the same, and associated methods KUKDO ADVANCED MATERIALS CO., LTD. (KR) 2009-03-26 US claimed
EP-1992668-A1 Photopolymer resins for photo replication of information layers Addison Clear Wave LLC (US) 2008-11-19 EP claimed
US-20080078974-A1 ORGANIC POLYMER PARTICLES AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2008-04-03 US claimed
US-7261996-B2 Halogen-free dry film photosensitive resin composition ETERNAL CHEMICAL CO., LTD. (CN) 2007-08-28 US claimed
US-20060178448-A1 Halogen-free dry film photosensitive resin composition ETERNAL CHEMICAL CO., LTD. 2006-08-10 US claimed
US-5932381-A SENSITIVITY, SMOOTHNESSS, WATERPROOF IWATSU ELECTRIC COMPANY, LTD. (JP) 1999-08-03 US claimed
US-5707543-A LIGHT SCATTERING AND RADIATION TRANSPARENT MEDIUM ON SUBSTRATES FOR OPTICAL RECORDING MEDIA USING LIQUID CRYSTALS FUJI XEROX CO., LTD. (JP) 1998-01-13 US claimed
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US claimed