Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.56 |
| ▸ | THRB | P10828 | 1/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | APEX1 | P27695 | 1/20 | 0.43 |
| ▸ | HTT | P42858 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | FKBP1A | P62942 | 3/20 | 0.36 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL422679 | 0.97 | TSHR (0.51) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL194104 | 0.94 | TSHR (0.50) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL208911 | 0.93 | THRB (0.52) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL12192405 | 0.92 | TSHR (0.53) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL16466670 | 0.91 | TSHR (0.46) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL195287 | 0.91 | TSHR (0.46) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL14473517 | 0.87 | THRB (0.46) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL513380 | 0.87 | THRB (0.46) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL73761 | 0.87 | THRB (0.46) | TSHRTHRBPOLBAPEX1HTT | |
| SCHEMBL16466610 | 0.87 | THRB (0.46) | TSHRTHRBPOLBAPEX1HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170160637-A9 | UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2017-06-08 | — | — | US | disclosed |
| US-20160109801-A1 | UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2016-04-21 | — | — | US | disclosed |
| US-9285681-B2 | Photosensitive resin composition and uses thereof | CHI MEI CORPORATION (TW) | 2016-03-15 | — | — | US | disclosed |
| US-9261789-B2 | Liquid immersion lithography upper-layer film-forming composition and photoresist pattern-forming method | JSR CORPORATION (JP) | 2016-02-16 | — | — | US | disclosed |
| US-9086532-B2 | Blue photosensitive resin composition for color filter and uses thereof | CHI MEI CORPORATION (TW) | 2015-07-21 | — | — | US | disclosed |
| US-9029051-B2 | Photosensitive resin composition, color filter and liquid crystal display device | CHI MEI CORPORATION (TW) | 2015-05-12 | — | — | US | disclosed |
| US-20150042931-A1 | BLUE PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND USES THEREOF | CHI MEI CORPORATION (TW) | 2015-02-12 | — | — | US | disclosed |
| US-20140356786-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2014-12-04 | — | — | US | disclosed |
| US-8722768-B2 | Liquid resin composition and semiconductor device | SUMITOMO BAKELITE CO., LTD. (JP) | 2014-05-13 | — | — | US | disclosed |
| US-8697344-B2 | Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern | JSR CORPORATION (JP) | 2014-04-15 | — | — | US | disclosed |
| US-20130244177-A1 | PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER AND LIQUID CRYSTAL DISPLAY DEVICE | CHI MEI CORPORATION (TW) | 2013-09-19 | — | — | US | disclosed |
| US-20130216961-A1 | COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UPPER LAYER FILM FOR IMMERSION EXPOSURE, AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2013-08-22 | — | — | US | disclosed |
| EP-2624287-A1 | LIQUID RESIN COMPOSITION AND SEMICONDUCTOR DEVICE | Sumitomo Bakelite Co., Ltd. (JP) | 2013-08-07 | — | — | EP | disclosed |
| US-20130143983-A1 | LIQUID RESIN COMPOSITION AND SEMICONDUCTOR DEVICE | SUMITOMO BAKELITE CO., LTD. (JP) | 2013-06-06 | — | — | US | disclosed |
| US-8431332-B2 | Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern | JSR CORPORATION (JP) | 2013-04-30 | — | — | US | disclosed |
| US-20120021359-A1 | UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2012-01-26 | — | — | US | disclosed |
| US-20100255416-A1 | COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UPPER LAYER FILM FOR IMMERSION EXPOSURE, AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |