SCHEMBL73761

SCHEMBL73761

C=C(C)C(=O)OCCOC(=O)C1CCCCC1C(=O)O

nearest known ligand 0.65

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.46
TSHR P16473 3/20 0.41
ALDH1A1 P00352 1/20 0.40
TP53 P04637 1/20 0.40
CYP3A4 P08684 1/20 0.40
HTT P42858 2/20 0.35
POLB P06746 1/20 0.35
APEX1 P27695 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
PEPD P12955 1/20 0.35
KDM4E B2RXH2 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14473517 1.00 THRB (0.46) THRBTSHRALDH1A1TP53CYP3A4
SCHEMBL75023 0.97 THRB (0.46) THRBTSHRALDH1A1TP53CYP3A4
SCHEMBL194104 0.94 TSHR (0.50) THRBTSHRALDH1A1TP53CYP3A4
SCHEMBL195287 0.94 TSHR (0.46) THRBTSHRALDH1A1TP53CYP3A4
SCHEMBL208911 0.93 THRB (0.52) THRBTSHRALDH1A1TP53CYP3A4
SCHEMBL12192405 0.92 TSHR (0.53) THRBTSHRALDH1A1TP53CYP3A4
SCHEMBL16913018 0.88 TP53 (0.36) THRBTSHRALDH1A1TP53CYP3A4
SCHEMBL29091106 0.88 THRB (0.41) THRBTSHRALDH1A1TP53CYP3A4
SCHEMBL12192407 0.88 THRB (0.43) THRBTSHRALDH1A1TP53CYP3A4
SCHEMBL17531129 0.88 THRB (0.44) THRBTSHRALDH1A1HTTPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1420 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117025052-B Water-based superhydrophobic consolidation material for TIT (tungsten inert gas) embedding seal layer 北京中科安途交通科技有限公司 2025-05-06 CN claimed
CN-118562416-A Silicon-based negative electrode binder of high-performance lithium ion battery and preparation method thereof 东营市海科瑞林化工有限公司 2024-08-30 CN claimed
WO-2022013049-A1 METHOD FOR FABRICATING A PARTICLE MERCK PATENT GMBH (DE) 2022-01-20 WO claimed
WO-2021099233-A1 METHOD FOR FABRICATING A PARTICLE MERCK PATENT GMBH (DE) 2021-05-27 WO claimed
US-10866661-B2 Film touch sensor and method for fabricating the same DONGWOO FINE-CHEM CO., LTD. (KR) 2020-12-15 US claimed
CN-110951008-A Solid sheet-shaped polycarboxylic slump retaining agent prepared by soap-free emulsion polymerization method and method 湖北工业大学 2020-04-03 CN claimed
CN-110724416-A Preparation method of modified hydroxyl ester-based polymer emulsion 湖北工业大学 2020-01-24 CN claimed
CN-110698587-A Preparation method of high-performance super-concentrated emulsion polymer 湖北工业大学 2020-01-17 CN claimed
CN-110684148-A Preparation method of cationic ester-based soap-free emulsion polymer 湖北工业大学 2020-01-14 CN claimed
CN-110684145-A Preparation method of super-concentrated carboxyl ester emulsion polymer 湖北工业大学 2020-01-14 CN claimed
EP-1861469-A1 PIGMENT DISPERSANT, METHOD OF MAKING COATING COMPOSITIONS, AND COATING COMPOSITIONS Basf Corporation (US) 2007-12-05 EP claimed
US-7261996-B2 Halogen-free dry film photosensitive resin composition ETERNAL CHEMICAL CO., LTD. (CN) 2007-08-28 US claimed
US-20070062412-A1 PIGMENT DISPERSANT, METHOD OF MAKING COATING COMPOSITIONS, AND COATING COMPOSITIONS BASF CORPORATION (US) 2007-03-22 US claimed
WO-2006102341-A1 PIGMENT DISPERSANT, METHOD OF MAKING COATING COMPOSITIONS, AND COATING COMPOSITIONS BASF CORPORATION (US) 2006-09-28 WO claimed
US-20060178448-A1 Halogen-free dry film photosensitive resin composition ETERNAL CHEMICAL CO., LTD. 2006-08-10 US claimed
CN-1167751-C Polymer electrolyte Сɽ�N 2004-09-22 CN claimed
CN-1267683-A Polymer electrolyte OYAMA NOBORU (JP) 2000-09-27 CN claimed
US-5932381-A SENSITIVITY, SMOOTHNESSS, WATERPROOF IWATSU ELECTRIC COMPANY, LTD. (JP) 1999-08-03 US claimed
US-5707543-A LIGHT SCATTERING AND RADIATION TRANSPARENT MEDIUM ON SUBSTRATES FOR OPTICAL RECORDING MEDIA USING LIQUID CRYSTALS FUJI XEROX CO., LTD. (JP) 1998-01-13 US claimed
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US claimed