SCHEMBL25476191

SCHEMBL25476191

Cc1ccc(C(=O)OCCS(=O)(=O)O)c(Cl)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NPC1 O15118 4/20 0.46
▸ RAB9A P51151 4/20 0.46
▸ HPGD P15428 2/20 0.46
▸ SMN1; SMN2 Q16637 1/20 0.46
▸ PKM P14618 2/20 0.44
▸ CHRM2 P08172 1/20 0.44
▸ CHRM3 P20309 1/20 0.44
▸ MAOA P21397 1/20 0.44
▸ HTR2C P28335 1/20 0.44
▸ CHRNA4 P43681 1/20 0.44
▸ HTR3A P46098 1/20 0.44
▸ KCNH2 Q12809 1/20 0.44
▸ HRH3 Q9Y5N1 1/20 0.44
▸ ALOX15 P16050 1/20 0.43
▸ KMT2A Q03164 1/20 0.42
▸ KDM4E B2RXH2 2/20 0.40
▸ CDK5 Q00535 1/20 0.40
▸ KLF5 Q13887 1/20 0.40
▸ CDK5R1 Q15078 1/20 0.40
▸ MAPT P10636 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20908983 0.89 CYP4F2 (0.46) NPC1RAB9AHPGDSMN1; SMN2KMT2A
SCHEMBL18775878 0.85 KMT2A (0.53) NPC1RAB9AHPGDSMN1; SMN2CHRM2
SCHEMBL25476209 0.85 MEN1 (0.48) NPC1RAB9ASMN1; SMN2PKMKMT2A
SCHEMBL25476179 0.84 SERPINE1 (0.51) NPC1RAB9AKMT2AKDM4ECA12
SCHEMBL19756055 0.83 CHRM2 (0.41) HPGDPKMCHRM2CHRM3MAOA
SCHEMBL17578250 0.82 MEN1 (0.48) NPC1HPGDSMN1; SMN2ALOX15KMT2A
SCHEMBL25476229 0.82 GAA (0.47) NPC1RAB9AHPGDSMN1; SMN2PKM
SCHEMBL20908982 0.81 KLF10 (0.50) NPC1RAB9AKMT2AKDM4ECA12
SCHEMBL25527923 0.81 KMT2A (0.41) NPC1RAB9AHPGDSMN1; SMN2PKM
SCHEMBL25476200 0.80 ALDH1A1 (0.42) NPC1RAB9AHPGDSMN1; SMN2ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161255-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
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