Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CCR9 | P51686 | 4/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.46 |
| ▸ | CCR2 | P41597 | 6/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.41 |
| ▸ | CASP1 | P29466 | 1/20 | 0.41 |
| ▸ | CASP7 | P55210 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | ATM | Q13315 | 1/20 | 0.40 |
| ▸ | GPR35 | Q9HC97 | 2/20 | 0.39 |
| ▸ | KMO | O15229 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL708036 | 0.81 | CCR2 (0.63) | ALDH1A1MCL1CCR2KMT2AMEN1 | |
| SCHEMBL20909819 | 0.81 | CCR9 (0.62) | CCR9ALDH1A1MCL1CCR2GPR35 | |
| SCHEMBL20909816 | 0.78 | MCL1 (0.49) | CCR9ALDH1A1MCL1CCR2HSD17B10 | |
| SCHEMBL20909826 | 0.77 | CCR9 (0.55) | CCR9MCL1CCR2GPR35KMO | |
| SCHEMBL6838506 | 0.75 | ALDH1A1 (0.67) | CCR9ALDH1A1MCL1CCR2HSD17B10 | |
| SCHEMBL9613229 | 0.74 | GPR35 (0.48) | CCR9ALDH1A1CCR2KMT2AMEN1 | |
| SCHEMBL1260741 | 0.74 | CCR2 (0.56) | ALDH1A1CCR2GPR35 | |
| SCHEMBL8352 | 0.73 | LDHA (0.61) | CCR9ALDH1A1MCL1CCR2HSD17B10 | |
| SCHEMBL6834189 | 0.73 | AKR1C2 (0.48) | ALDH1A1KMT2AMEN1 | |
| SCHEMBL3638805 | 0.72 | MCL1 (0.53) | CCR9ALDH1A1MCL1CCR2HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20190113842-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-04-18 | — | — | US | disclosed |