Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC1A3 | P43003 | 2/20 | 0.46 |
| ▸ | SLC1A2 | P43004 | 2/20 | 0.46 |
| ▸ | SLC1A1 | P43005 | 2/20 | 0.46 |
| ▸ | LTA4H | P09960 | 1/20 | 0.44 |
| ▸ | PLA2G4B | P0C869 | 1/20 | 0.38 |
| ▸ | PPARA | Q07869 | 2/20 | 0.38 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | FAAH | O00519 | 1/20 | 0.37 |
| ▸ | ALB | P02768 | 1/20 | 0.37 |
| ▸ | TBXAS1 | P24557 | 2/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20912422 | 0.95 | SLC1A3 (0.47) | SLC1A3SLC1A2SLC1A1LTA4HPLA2G4B | |
| SCHEMBL20912421 | 0.89 | SLC1A3 (0.49) | SLC1A3SLC1A2SLC1A1LTA4H | |
| SCHEMBL20912447 | 0.81 | LTA4H (0.44) | SLC1A3SLC1A2SLC1A1LTA4HMAPT | |
| SCHEMBL8906379 | 0.80 | SLC1A3 (0.40) | SLC1A3SLC1A2SLC1A1LTA4HMAPT | |
| SCHEMBL6042877 | 0.78 | SLC1A3 (0.41) | SLC1A3SLC1A2SLC1A1LTA4HALDH1A1 | |
| SCHEMBL712393 | 0.78 | MAPT (0.56) | PPARAEPHX2MAPTRXFP1FAAH | |
| SCHEMBL4369059 | 0.78 | MAPT (0.56) | MAPTRXFP1TBXAS1 | |
| SCHEMBL8905224 | 0.78 | SLC1A3 (0.44) | SLC1A3SLC1A2SLC1A1LTA4HMAPT | |
| SCHEMBL8687331 | 0.78 | SLC1A3 (0.51) | SLC1A3SLC1A2SLC1A1LTA4HMAPT | |
| SCHEMBL2871485 | 0.77 | MAPT (0.59) | PPARAEPHX2MAPTRXFP1FAAH |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11269251-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-03-08 | — | — | US | disclosed |
| US-20190113844-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-04-18 | — | — | US | disclosed |