SCHEMBL20912421

SCHEMBL20912421

O=C(O)CCOCc1ccsc1

nearest known ligand 0.49

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
SLC1A3 P43003 2/20 0.49
SLC1A2 P43004 2/20 0.49
SLC1A1 P43005 2/20 0.49
LTA4H P09960 1/20 0.44
FOLH1 Q04609 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
LCK P06239 1/20 0.37
FYN P06241 1/20 0.37
DAO P14920 1/20 0.37
PARP15 Q460N3 1/20 0.36
PARP10 Q53GL7 1/20 0.36
PARP3 Q9Y6F1 1/20 0.36
TAAR1 Q96RJ0 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20912422 0.90 SLC1A3 (0.47) SLC1A3SLC1A2SLC1A1LTA4HFOLH1
SCHEMBL20912423 0.89 SLC1A3 (0.46) SLC1A3SLC1A2SLC1A1LTA4H
SCHEMBL20912446 0.85 LTA4H (0.43) SLC1A3SLC1A2SLC1A1LTA4HL3MBTL1
SCHEMBL8687331 0.82 SLC1A3 (0.51) SLC1A3SLC1A2SLC1A1LTA4HL3MBTL1
SCHEMBL8689058 0.78 SLC1A3 (0.42) SLC1A3SLC1A2SLC1A1LTA4HPARP15
SCHEMBL20912435 0.77 L3MBTL1 (0.55) LTA4HL3MBTL1
SCHEMBL599876 0.76 KEAP1 (0.54) SLC1A3SLC1A2SLC1A1LTA4HLCK
SCHEMBL508419 0.76 TSHR (0.56) FOLH1L3MBTL1
SCHEMBL20912447 0.76 LTA4H (0.44) SLC1A3SLC1A2SLC1A1LTA4HTAAR1
SCHEMBL6042877 0.75 SLC1A3 (0.41) SLC1A3SLC1A2SLC1A1LTA4HPARP15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11269251-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-03-08 US disclosed
US-20190113844-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-04-18 US disclosed