SCHEMBL20928637

SCHEMBL20928637

O=C(O)c1nnncc1S

nearest known ligand 0.31

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.31
ALDH1A1 P00352 2/20 0.31
HDAC8 Q9BY41 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
CYP1A2 P05177 1/20 0.31
CYP2C9 P11712 1/20 0.31
HSD17B10 Q99714 1/20 0.31
HCAR2 Q8TDS4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2732654 0.76 KDM4E (0.38) MAPTALDH1A1SMN1; SMN2CYP1A2CYP2C9
SCHEMBL11398163 0.74 KDM4E (0.39) MAPTALDH1A1SMN1; SMN2
SCHEMBL31230833 0.71
SCHEMBL20928645 0.70 MAPT (0.40) MAPTALDH1A1HDAC8SMN1; SMN2CYP1A2
SCHEMBL20928636 0.70 MAPT (0.35) MAPTALDH1A1HDAC8CYP1A2HCAR2
Phosphoric Acid SCHEMBL28973511 0.69 KDM4E (0.33) MAPTALDH1A1HSD17B10
SCHEMBL22027683 0.67 ALDH1A1 (0.38) MAPTALDH1A1SMN1; SMN2CYP1A2CYP2C9
SCHEMBL31398573 0.66
SCHEMBL20928646 0.65 HCAR2 (0.43) MAPTALDH1A1HDAC8SMN1; SMN2CYP1A2
SCHEMBL27730537 0.63 KMT2A (0.36) MAPTALDH1A1SMN1; SMN2HCAR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11022880-B2 Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound TOKYO OHKA KOGYO CO., LTD. (JP) 2021-06-01 US disclosed
US-20190121233-A1 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2019-04-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20190121233-A1 CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND CUTA, POLR1C, ASIC1 MAPT 1711/4885ALDH1A1 639/4885HDAC8 4748/4885
US-11022880-B2 Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound CUTA, POLR1C, ASIC1 MAPT 1711/4885ALDH1A1 639/4885HDAC8 4748/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.