SCHEMBL2093349

SCHEMBL2093349

[CH2]c1ccc(-c2ccc(OC)cc2)cc1

nearest known ligand 0.74

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR2 Q92731 1/20 0.58
CA1 P00915 2/20 0.58
CA2 P00918 2/20 0.58
CA7 P43166 2/20 0.58
CA9 Q16790 2/20 0.58
CA12 O43570 1/20 0.58
CA14 Q9ULX7 1/20 0.58
MAPK1 P28482 3/20 0.52
TP53 P04637 2/20 0.52
NPC1 O15118 2/20 0.52
RAB9A P51151 2/20 0.52
CASP3 P42574 1/20 0.52
SMN1; SMN2 Q16637 1/20 0.52
SENP8 Q96LD8 1/20 0.52
SENP7 Q9BQF6 1/20 0.52
SENP6 Q9GZR1 1/20 0.52
APP P05067 1/20 0.50
DYRK1A Q13627 1/20 0.50
MAOB P27338 2/20 0.48
ME2 P23368 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3223 0.92
SCHEMBL10598384 0.89 CA1 (0.65) ESR2CA1CA2CA7CA9
SCHEMBL20913241 0.89 CA1 (0.65) ESR2CA1CA2CA7CA9
SCHEMBL197522 0.86 CA1 (0.79) ESR2CA1CA2CA7CA9
SCHEMBL9151672 0.86 CA1 (0.79) ESR2CA1CA2CA7CA9
SCHEMBL6733562 0.86 CA1 (0.79) ESR2CA1CA2CA7CA9
SCHEMBL2096923 0.84 LTA4H (0.61) CA1CA2CA7CA9CA12
SCHEMBL8438727 0.80 HPGD (0.55) CA1CA2CA7CA9CA12
SCHEMBL2091379 0.79 ESR2 (0.58) ESR2CA1CA2CA7CA9
SCHEMBL40356 0.78 PTGS2 (0.53) CA1CA2CA7CA9CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 105 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024147306-A1 AMIDE COMPOUND AND HARMFUL ARTHROPOD CONTROL COMPOSITION CONTAINING SAME 住友化学株式会社 2024-07-11 WO disclosed
CN-118159910-A Additive-containing silicon-containing resist underlayer film forming composition 日产化学株式会社 2024-06-07 CN disclosed
CN-117940850-A Composition for forming silicon-containing resist underlayer film, laminate using same, and method for producing semiconductor element 日产化学株式会社 2024-04-26 CN disclosed
CN-117716295-A Composition for forming silicon-containing resist underlayer film and silicon-containing resist underlayer film 日产化学株式会社 2024-03-15 CN disclosed
CN-117460995-A Composition for forming underlayer film of silicon-containing resist 日产化学株式会社 2024-01-26 CN disclosed
CN-117396810-A Composition for forming silicon-containing resist underlayer film 日产化学株式会社 2024-01-12 CN disclosed
CN-117396811-A Composition for forming underlayer film of silicon-containing resist 日产化学株式会社 2024-01-12 CN disclosed
CN-117255971-A Composition for forming silicon-containing resist underlayer film 日产化学株式会社 2023-12-19 CN disclosed
CN-117083570-A Composition for forming silicon-containing resist underlayer film 日产化学株式会社 2023-11-17 CN disclosed
CN-117063129-A Composition for forming silicon-containing underlayer film for directional self-assembly 日产化学株式会社 2023-11-14 CN disclosed
US-4721666-A Photographic element FUJI PHOTO FILM CO., LTD. (JP) 1988-01-26 US disclosed
US-4720446-A Color photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1988-01-19 US disclosed
US-4636455-A APPLYING WATER, HEATING AND SWELLING FUJI PHOTO FILM CO., LTD. (JP) 1987-01-13 US disclosed
US-4613597-A ANTICOAGULANTS, VASODILATORS, BRONCHODILATORS GLAXO GROUP LIMITED (GB) 1986-09-23 US disclosed
US-4596756-A Ethylenically unsaturated monomer, unsaturated nitrile containing monomer FUJI PHOTO FILM CO., LTD. (JP) 1986-06-24 US disclosed
EP-0160947-A2 Photographic element FUJI PHOTO FILM CO., LTD. (JP) 1985-11-13 EP disclosed
US-4497893-A BACKING CONTAINS GELATIN AND CATIONIC POLYMER FUJI PHOTO FILM CO., LTD. (JP) 1985-02-05 US disclosed
EP-0129219-A2 Photographic elements FUJI PHOTO FILM CO., LTD. (JP) 1984-12-27 EP disclosed
US-4374924-A CATIONIC POLYMERS COMPRISING QUATERNIZED COPOLYMERS OF P-DIVINYLBENZENE OR A DIACRYLIC ESTER AND AN AMINO-CONTAINING ACRYLIC ESTER OR AMIDE FUJI PHOTO FILM CO., LTD. (JP) 1983-02-22 US disclosed
US-4312940-A FOR ACID DYES; REMOVABLE DURING ALKALINE PROCESSING FUJI PHOTO FILM CO., LTD. (JP) 1982-01-26 US disclosed